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Results 1 to 21 of 21

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New SNF genes, GAL11 and GRR1 affect SUC2 expression in Saccharomyces cerevisiaeVALLIER, L. G; CARLSON, M.Genetics. 1991, Vol 129, Num 3, pp 675-684, issn 0016-6731Article

Synergistic release from glucose repression by mig1 and ssn mutations in Saccharomyces cerevisiaeVALLIER, L. G; CARLSON, M.Genetics. 1994, Vol 137, Num 1, pp 49-54, issn 0016-6731Article

Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmasJOUBERT, O; PARGON, E; FOUCHER, J et al.Microelectronic engineering. 2003, Vol 69, Num 2-4, pp 350-357, issn 0167-9317, 8 p.Conference Paper

Influence of the nature of the mask on polysilicon gate patterning in high density plasmasBELL, F. H; JOUBERT, O; VALLIER, L et al.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 333-336, issn 0167-9317Conference Paper

Production d'un plasma de grande longueur par une structure filaire microonde = Production of high length plasma by microwave thread structureARNAL, Y; PELLETIER, J; POMATHIOD, L et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 235-237, issn 0223-4335, SUPConference Paper

Use of cooled CCD cameras to control multicharged ion beam processesVALLIER, L; LE ROUX, V; BORSONI, G et al.SPIE proceedings series. 2001, pp 37-43, isbn 0-8194-4106-6Conference Paper

Influence of ion energy on the physical properties of plasma deposited SiO2 filmsJOUBERT, O; BURKE, R; VALLIER, L et al.Applied physics letters. 1993, Vol 62, Num 3, pp 228-230, issn 0003-6951Article

Dependence of ultra-thin SiO2 layers formation by ultra-slow single and multicharged ions on process conditionsBORSONI, G; LE ROUX, V; CHABLI, A et al.Microelectronic engineering. 2001, Vol 59, Num 1-4, pp 311-315, issn 0167-9317Conference Paper

Millitorr rnage PECVD of a-SiO2 films using TEOS and oxygenTEMPLIER, F; VALLIER, L; MADAR, R et al.Thin solid films. 1994, Vol 241, Num 1-2, pp 251-254, issn 0040-6090Conference Paper

Microwave multipolar plasmas excited by distributed electron cyclotron resonance: concept and performancePICHOT, M; DURANDET, A; PELLETIER, J et al.Review of scientific instruments. 1988, Vol 59, Num 7, pp 1072-1075, issn 0034-6748Article

Correlation and interaction between sidewall passivation and chamber walls deposition during silicon gate etchingKOGELSCHATZ, M; CUNGE, G; JOUBERT, O et al.Contributions to plasma physics (1985). 2004, Vol 44, Num 5-6, pp 413-425, issn 0863-1042, 13 p.Conference Paper

Silicon gate notching for patterning features with dimensions smaller than the resolution of the lithographyFOUCHER, J; CUNGE, G; VALLIER, L et al.Microelectronic engineering. 2002, Vol 61-62, pp 849-857, issn 0167-9317Conference Paper

Study of thin gate oxide etching during plasma patterning of 0,1 μm Si gatesDESVOIVRES, L; BONVALOT, M; VALLIER, L et al.Microelectronic engineering. 1999, Vol 46, Num 1-4, pp 295-298, issn 0167-9317Conference Paper

Inhibition of activin/nodal signalling is necessary for pancreatic differentiation of human pluripotent stem cellsCHO, C. H.-H; HANNAN, N. R.-F; DOCHERTY, F. M et al.Diabetologia (Berlin). 2012, Vol 55, Num 12, pp 3284-3295, issn 0012-186X, 12 p.Article

Patterning of narrow porous SiOCH trenches using a TiN hard maskDARNON, M; CHEVOLLEAU, T; TORRES, J et al.Microelectronic engineering. 2008, Vol 85, Num 11, pp 2226-2235, issn 0167-9317, 10 p.Article

Plasma/reactor walls interactions in advanced gate etching processesRAMOS, R; CUNGE, G; JOUBERT, O et al.Thin solid films. 2007, Vol 515, Num 12, pp 4846-4852, issn 0040-6090, 7 p.Conference Paper

Etching of silicon native oxide using ultraslow multicharged Arq+ ionsLE ROUX, V; MACHICOANE, G; RUZYLLO, J et al.Journal of the Electrochemical Society. 2004, Vol 151, Num 1, pp G76-G79, issn 0013-4651Article

X-ray photoelectron spectroscopy analyses of oxide-masked polycrystalline SiGe features etched in a high-density plasma sourceMONGET, C; VALLON, S; BELL, F. H et al.Journal of the Electrochemical Society. 1997, Vol 144, Num 7, pp 2455-2461, issn 0013-4651Article

B doped SiGe/Si heteroepitaxy by distributed electron cyclotron resonance (DECR)VALLIER, L; BURKE, R; JOUBERT, O et al.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 210-212, issn 0223-4335, SUPConference Paper

Molecular and genetic analysis of the SNF7 gene in Saccharomyces cerevisiaeJIANGLING TU; VALLIER, L. G; CARLSON, M et al.Genetics. 1993, Vol 135, Num 1, pp 17-23, issn 0016-6731Article

Altered regulatory responses to glucose are associated with a glucose transport defect in grr1 mutants of Saccharomyces cerevisiaeVALLIER, L. G; COONS, D; BISSON, L. F et al.Genetics. 1994, Vol 136, Num 4, pp 1279-1285, issn 0016-6731Article

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