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Low-k1 imaging : how low can we go?FINDERS, Jo; EURLINGS, Mark; VAN INGEN SCHENAU, Koen et al.SPIE proceedings series. 2000, pp 1-15, isbn 0-8194-3898-7Conference Paper

New advanced BARC materials for ultra-high NA applicationsCLAYPOOL, James B; WEIMER, Marc; KRISHNAMURTHY, Vandana et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 679-689Conference Paper

Scatterometry based 65nm node CDU analysis and prediction using novel reticle measurement techniqueVAN INGEN SCHENAU, Koen; VANOPPEN, Peter; VAN DER LAAN, Hans et al.SPIE proceedings series. 2005, isbn 0-8194-5732-9, 3Vol, Part 3, 1312-1322Conference Paper

EUV simulation extension study for mask shadowing effect and its correctionKANG, Hoyoung; HANSEN, Steve; VAN SCHOOT, Jan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69213I.1-69213I.11, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

Photoresist induced Contrast Loss and its Impact on EUV Imaging ExtendibilityVAN INGEN SCHENAU, Koen; HANSEN, Steve; PIERSON, Bill et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692314.1-692314.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Spot sensor enabled reticle uniformity measurements for 65nm CDU analysis with scatterometryJANSSEN, Maurice; VAN INGEN SCHENAU, Koen; VAN DER LAAN, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810F.1-62810F.8, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

The Lithography Technology for the 32 nm HP and BeyondDUSA, Mircea; ARNOLD, Bill; FINDERS, Jo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702810.1-702810.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The random contact hole solutions for future technology nodesCHEN, Alek; HANSEN, Steve; MOERS, Marco et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65201B.1-65201B.12, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

EUV into production with ASML's NXE platformWAGNER, Christian; HARNED, Noreen; THUERING, Bernd et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76361H.1-76361H.12, 2Conference Paper

EUV imaging performance: moving towards productionVAN SETTEN, Eelco; LOK, Sjoerd; VAN DIJK, Joep et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700G.1-74700G.12Conference Paper

Measuring resist-induced contrast loss using EUV interference lithographyLANGNER, Andreas; SOLAK, Harun H; GRONHEID, Roel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76362X.1-76362X.11, 2Conference Paper

Imaging budgets for EUV optics: Ready for 22nm node and beyondBIENERT, Marc; GÖHNEMEIER, Aksel; NATT, Oliver et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7271, issn 0277-786X, isbn 978-0-8194-7524-4 0-8194-7524-6, 72711B.1-72711B.12, 2Conference Paper

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection toolsWALLOW, Thomas I; PIERSON, Bill; KOAY, Chiew-Seng et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72733T.1-72733T.11, 2Conference Paper

The contact hole solutions for future logic technology nodesCHEN, Alek; HANSEN, Steve; MOERS, Marco et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271O.1-68271O.12, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Enabling the 45nm node by hyper-NA polarized lithographyDE BOEIJ, Wim; SWINKELS, Geert; HANSEN, Steve et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 1, 61540B.1-61540B.11Conference Paper

Pitch Doubling Through Dual Patterning Lithography Challenges in Integration and Litho BudgetsDUSA, Mircea; QUAEDACKERS, John; VLEEMING, Bert et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65200G.1-65200G.10, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

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