Pascal and Francis Bibliographic Databases

Help

Search results

Your search

au.\*:("VEPREK S")

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 130

  • Page / 6

Export

Selection :

  • and

APPLICATIONS OF LOW PRESSURE PLASMAS IN MATERIALS SCIENCE: ESPECIALLY CHEMICAL VAPOUR DEPOSITIONVEPREK S.1980; CURR. TOP. MATER. SCI.; NLD; DA. 1980; VOL. 4; PP. 151-236; BIBL. 271 REF.Article

A THEORETICAL APPROACH TO HETEROGENEOUS REACTIONS IN NON-ISOTHERMAL LOW PRESSURE PLASMAVEPREK S.1975; TOPICS CURR. CHEM.; GERM.; DA. 1975; VOL. 56; PP. 139-159; BIBL. 2 P.Article

PRAEPARATIVE FESTKOERPERCHEMIE IN NIEDERDRUCKPLASMEN = CHIMIE DE PREPARATION DES MATERIAUX DANS LES PLASMAS A BASSE PRESSIONVEPREK S.1980; CHIMIA; ISSN 0009-4293; CHE; DA. 1980; VOL. 34; NO 12; PP. 489-501; ABS. ENG; BIBL. 98 REF.Article

STATISTICAL MODEL OF CHEMICAL REACTIONS IN NONISOTHERMAL LOW PRESSURE PLASMAVEPREK S.1972; J. CHEM. PHYS.; U.S.A.; DA. 1972; VOL. 57; NO 2; PP. 952-959; BIBL. 47 REF.Serial Issue

KINETIC STUDY OF THE HETEROGENEOUS SI/H SYSTEM UNDER LOW-PRESSURE PLASMA CONDITIONS BY MEANS OF MASS SPECTROMETRYWAGNER JJ; VEPREK S.1982; PLASMA CHEM. PLASMA PROCESS.; ISSN 507814; USA; DA. 1982; VOL. 2; NO 1; PP. 95-107; BIBL. 11 REF.Article

REACTIVITY OF SOLID SILICON WITH HYDROGEN UNDER CONDITIONS OF A LOW PRESSURE PLASMAWEBB AP; VEPREK S.1979; CHEM. PHYS. LETTERS; NLD; DA. 1979; VOL. 62; NO 1; PP. 173-177; BIBL. 11 REF.Article

Surface processes and rate-determining steps in plasma-induced chemical vapour deposition : titanium nitride, boron carbide and siliconVEPREK, S.Surface & coatings technology. 1990, Vol 43-44, Num 1-3, pp 154-166, issn 0257-8972, 13 p.Conference Paper

Chemical transport in non-isothermal low pressure plasmasVEPREK, S.Journal of the less-common metals. 1988, Vol 137, pp 367-373, issn 0022-5088Article

Plasma-induced and plasma-assisted chemical vapour depositionVEPREK, S.Thin solid films. 1985, Vol 130, Num 1-2, pp 135-154, issn 0040-6090Article

ON THE CHEMICAL EROSION OF A CARBON FIRST WALL PROPOSED FOR TOKAMAK DEVICES FOR CONTROLLED NUCLEAR FUSION.VEPREK S; HAQUE MR.1975; APPL. PHYS.; GERM.; DA. 1975; VOL. 8; NO 4; PP. 303-309; BIBL. 33 REF.Article

WALL PROCESSES AND RADIAL GAIN OF THE CW HCN LASER.SCHOETZAU HJ; VEPREK S.1975; APPL. PHYS.; GERM.; DA. 1975; VOL. 7; NO 4; PP. 271-277; BIBL. 28 REF.Article

Superhard nanocomposites: design concept, properties, present and future industrial applicationsVEPREK, S.EPJ. Applied physics (Print). 2004, Vol 28, Num 3, pp 313-317, issn 1286-0042, 5 p.Article

ELECTRON-IMPACT-INDUCED ANISOTROPIC ETCHING OF SILICON BY HYDROGENVEPREK S; SAROTT FA.1982; PLASMA CHEMISTRY AND PLASMA PROCESSING; ISSN 507814; USA; DA. 1982; VOL. 2; NO 3; PP. 233-246; BIBL. 22 REF.Article

RAMAN SCATTERING FROM HYDROGENATED MICROCRYSTALLINE AND AMORPHOUS SILICONIQBAL Z; VEPREK S.1982; JOURNAL OF PHYSICS. C. SOLID STATE PHYSICS; ISSN 0022-3719; GBR; DA. 1982; VOL. 15; NO 2; PP. 377-392; BIBL. 31 REF.Article

Large-area boron carbide protective coatings for controlled thermonuclear research prepared by in situ plasma CVDVEPREK, S.Plasma chemistry and plasma processing. 1992, Vol 12, Num 3, pp 219-235, issn 0272-4324Article

TRANSPORT OF PHOSPHORUS IN A LOW PRESSURE HYDROGEN PLASMAVEPREK S; OSWALD HR.1975; Z. ANORG. ALLG. CHEM.; DTSCH.; DA. 1975; VOL. 415; NO 2; PP. 190-192; ABS. ALLEM.; BIBL. 11 REF.Article

KINETICS AND CATALYSIS IN PLASMA CHEMISTRYMUNDIYATH VENUGOPALAN; VEPREK S.1983; TOP. CURR. CHEM.; ISSN 0340-1022; DEU; DA. 1983; VOL. 107; PP. 1-58; BIBL. 6 P.Article

ON THE INTERPRETATION OF THE FIRST, SHARP MAXIMUM IN THE X-RAY SCATTERING PATTERN OF NON-CRYSTALLINE SOLIDS AND LIQUIDSVEPREK S; BEYELER HU.1981; PHILOS. MAG., B; ISSN 0141-8637; GBR; DA. 1981; VOL. 44; NO 5; PP. 557-567; BIBL. 19 REF.Article

FORMATION OF LASER ACTIVE MOLECULES AND THE GAIN OF THE CW HCN-LASER.SCHOTZAU HJ; VEPREK S.sdIN: INT. CONF. INFRARED PHYS.; HONGGERBERG-ZURICH; 1975; S.L.; DA. S.D.; PP. C197-C199; BIBL. 10 REF.Conference Paper

Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: present status and future trendsVEPREK, S.Plasma chemistry and plasma processing. 1989, Vol 9, Num 1, pp 29S-54S, issn 0272-4324, supplArticle

RADIAL DISTRIBUTION FUNCTION OF AMORPHOUS PHOSPHORUS PREPARED BY CHEMICAL TRANSPORT IN A LOW-PRESSURE HYDROGEN PLASMABEYELER HU; VEPREK S.1980; PHILOS. MAG., B; ISSN 0141-8637; GBR; DA. 1980; VOL. 41; NO 3; PP. 327-340; BIBL. 21 REF.Article

BORON AND DOPED BORON FIRST WALL COATINGS BY PLASMA CVD = BOR- UND DOTIERTE BOR-ERSTE-WAND-BESCHICHTUNGEN MITTELS PLASMA-CVD = REVETEMENTS DE PREMIERE PAROI DE BORE ET DOTES EN BORE PAR LE PROCEDE CVD-PLASMAGRONER P; GIMZEWSKI JK; VEPREK S et al.1981; J. NUCL. MATER.; NLD; DA. 1981-12; VOL. 103/104; PP. 257-260; BIBL. 12 REF.Article

INTERACTION OF NITRIDED TITANIUM WITH A HYDROGEN PLASMABRAGANZA C; STUSSI H; VEPREK S et al.1979; J. NUCL. MATER.; ISSN 0022-3115; NLD; DA. 1979; VOL. 87; NO 2-3; PP. 331-340; BIBL. 18 REF.Article

APPLICATION OF MATRIX ISOLATION SPECTROSCOPY FOR THE DIAGNOSTIC INVESTIGATION OF LOW PRESSURE PLASMA. THE SYSTEMS CARBON/HYDROGEN AND CARBON/OXYGEN.VEPREK S; COCKE DL; GINGERICH KA et al.1975; CHEM. PHYS.; NETHERL.; DA. 1975; VOL. 7; NO 2; PP. 294-302; BIBL. 22 REF.Article

OPTICAL ABSORPTION IN HYDROGENATED MICROCRYSTALLINE SILICONIQBAL Z; SAROTT FA; VEPREK S et al.1983; JOURNAL OF PHYSICS. C. SOLID STATE PHYSICS; ISSN 0022-3719; GBR; DA. 1983; VOL. 16; NO 10; PP. 2005-2015; BIBL. 23 REF.Article

  • Page / 6