IN SITU DETERMINATION OF THE OPTICAL AND ELECTRICAL PROPERTIES OF THIN FILMS DURING THEIR DEPOSITION.GADENNE P; VUYE G.1977; J. PHYS. E; G.B.; DA. 1977; VOL. 10; NO 7; PP. 733-736; BIBL. 11 REF.Article

IN SITU INVESTIGATION OF METALLIC SURFACES BY SURFACE PLASMON ATR SPECTROSCOPY, ELECTRICAL RESISTANCE MEASUREMENTS AND AUGER SPECTROSCOPYLOPEZ RIOS T; VUYE G.1982; J. PHYS. E; ISSN 0022-3735; GBR; DA. 1982; VOL. 15; NO 4; PP. 456-461; BIBL. 25 REF.Article

REFLECTIVITE DIFFERENTIELLE COMBINEE A L'EXCITATION DE PLASMONS DE SURFACE POUR L'ETUDE DES SURFACES METALLIQUES = DIFFERENTIAL REFLECTIVITY COMBINED WITH SURFACE PLASMON EXCITATION FOR METALLIC SURFACE STUDYLOPEZ RIOS T; VUYE G.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 82; NO 1; PP. 23-31; ABS. ENG; BIBL. 12 REF.Conference Paper

USE OF SURFACE PLASMON EXCITATION FOR DETERMINATION OF THE THICKNESS AND OPTICAL CONSTANTS OF VERY THIN SURFACE LAYERSLOPEZ RIOS T; VUYE G.1979; SURF. SCI.; NLD; DA. 1979; VOL. 81; NO 2; PP. 529-538; BIBL. 20 REF.Article

PRECISION IN THE ELLIPSOMETRIC DETERMINATION OF THE OPTICAL CONSTANTS OF VERY THIN FILMSVUYE G; LOPEZ RIOS T.1982; APPL. OPT.; ISSN 0003-6935; USA; DA. 1982; VOL. 21; NO 16; PP. 2968-2971; BIBL. 5 REF.Article

SPLITTING OF THE AL SURFACE PLASMON DISPERSION CURVES BY AG SURFACE LAYERS.LOPEZ RIOS T; ABELES F; VUYE G et al.1978; J. PHYS.; FRA; DA. 1978; VOL. 39; NO 6; PP. 645-650; ABS. FR.; BIBL. 27 REF.Article

DIELECTRIC CONSTANT OF GOLD, COPPER, AND GOLD-COPPER ALLOYS BETWEEN 18 AND 35 EV = CONSTANTE DIELECTRIQUE DE L'OR, DU CUIVRE ET D'ALLIAGES OR-CUIVRE ENTRE 18 ET 35 EVBEAGLEHOLE D; DE CRESCENZI M; THEYE ML et al.1979; PHYS. REV., B; USA; DA. 1979; VOL. 19; NO 12; PP. 6303-6314; BIBL. 36 REF.Article

ETUDE DE QUELQUES FACTEURS DETERMINANT LA CROISSANCE ET LA CRISTALLISATION DES FILMS ANODIQUES SUR LE TITANE EN MILIEU ACIDE.JOUVE G; POLITI A; LACOMBE P et al.1978; J. LESS. COMMON METALS; NLD; DA. 1978; VOL. 59; NO 2; PP. 175-199; ABS. ENG; BIBL. 15 REF.Article

Comparative study of the optical properties of silver clusters and silver continuous overlayers on aluminium substrate by differential reflectometry = Etude comparative des propriétés optiques d'amas d'argent et de sur-couches continues d'argent sur un support d'aluminium par réflexométrie différentielleBORENSZTEIN, Y; LOPEZ-RIOS, T; VUYE, G et al.Journal de physique. Colloques. 1983, Vol 44, Num 10, pp C10.475-C10.478, issn 0449-1947Article

Roughening of a smooth cold Ag surface by Ag overlayers studied by differential reflectivity = Augmentation de la rugosité d'une surface d'argent froide lisse par des sur-couches d'argent étudiée par réflectivité différentielleLOPEZ-RIOS, T; BORENSZTEIN, Y; VUYE, G et al.Journal de physique. Lettres. 1983, Vol 44, Num 3, pp L99-L104, issn 0302-072XArticle

Electronic properties of copper and silver adsorbates on metallic surfaces, studied by surface reflectance spectroscopy = Propriétés électroniques d'adsorbats de cuivre et d'argent sur les surfaces métalliques, étudié par spectroscopie de réflectance de surfaceBORENSZTEIN, Y; LOPEZ-RIOS, T; VUYE, G et al.Journal de physique. Colloques. 1984, Num 5, pp C5.455-C5.459, issn 0449-1947Article

SERS of oxygen on Ag surfaces covered by Al submonolayers = La spectrométrie de la diffusion Raman augmentée en surface de l'oxygène sur des surfaces d'argent recouvertes de couches sous-monomoléculaires d'aluminiumGAO, Y; VUYE, G; LOPEZ-RIOS, T et al.Surface science. 1985, Vol 164, Num 2-3, pp L819-L822, issn 0039-6028Article

Influence of Al submonolayers on surface-enhanced Raman scattering of pyridine on Ag surfaces = Influence des couches sous-monomoléculaires d'Al sur la diffusion Raman augmentée en surface de la pyridine sur des surfaces d'argentLOPEZ-RIOS, T; GAO, Y; VUYE, G et al.Chemical physics letters. 1984, Vol 111, Num 3, pp 249-253, issn 0009-2614Article

Roughening of Ag surfaces by Ag deposits studied by differential reflectivity = Formation de rugosité pour des surfaces d'Ag par dépôts d'Ag étudiée par réflectivité différentielleLOPEZ-RIOS, T; BORENSZTEIN, Y; VUYE, G et al.Physical review. B, Condensed matter. 1984, Vol 30, Num 2, pp 659-671, issn 0163-1829Article

Optical properties of Si nanocrystals embedded in SiO₂GALLAS, B; STENGER, I; KAO, C.-C et al.Physical review B. Condensed matter and materials physics. 2005, Vol 72, Num 15, pp 155319.1-155319.10, issn 1098-0121Article

Near infrared absorption of Si nanoparticles embedded in silica filmsSTENGER, I; SIOZADE, L; GALLAS, B et al.Surface science. 2007, Vol 601, Num 14, pp 2912-2916, issn 0039-6028, 5 p.Article

Relations between the optical properties and the microstructure of TiO₂ thin films prepared by ion-assisted depositionLEPRINCE-WANG, Y; SOUCHE, D; YU-ZHANG, K et al.Thin solid films. 2000, Vol 359, Num 2, pp 171-176, issn 0040-6090Article

Temperature dependence of the dielectric function of silicon using in situ spectroscopic ellipsometryVUYE, G; FISSON, S; NGUYEN VAN, V et al.Thin solid films. 1993, Vol 233, Num 1-2, pp 166-170, issn 0040-6090Conference Paper

Laser annealing of SiO_x thin filmsGALLAS, B; KAO, C.-C; FISSON, S et al.Applied surface science. 2002, Vol 185, Num 3-4, pp 317-320, issn 0169-4332Article

Ellipsometric investigation of the Si/SiO₂ interface formation for application to highly reflective dielectric mirrorsGALLAS, B; FISSON, S; BRUNET-BRUNEAU, A et al.Thin solid films. 2000, Vol 377-78, pp 62-67, issn 0040-6090Conference Paper

Growth of low and high refractive index dielectric layers as studied by in situ ellipsometryNGUYEN VAN, V; FISSON, S; FRIGERIO, J. M et al.Thin solid films. 1994, Vol 253, Num 1-2, pp 257-261, issn 0040-6090Conference Paper

Infrared ellipsometric study of SiO₂ films : relationship between LO mode frequency and porosityBRUNET-BRUNEAU, A; FISSON, S; GALLAS, B et al.Thin solid films. 2000, Vol 377-78, pp 57-61, issn 0040-6090Conference Paper

Visible and infrared ellipsometry study of ion assisted SiO₂filmsSOUCHE, D; BRUNET-BRUNEAU, A; FISSON, S et al.Thin solid films. 1998, Vol 313-14, pp 676-681, issn 0040-6090Conference Paper

Study of CaF₂ growth on Si, a-SiO₂ by in situ spectroscopic ellipsometryRIVORY, J; FISSON, S; NGUYEN VAN, V et al.Thin solid films. 1993, Vol 233, Num 1-2, pp 260-263, issn 0040-6090Conference Paper

X-ray photoelectron spectroscopy study of the growth of dielectric films on various substratesWANG, Y; FISSON, S; NGUYEN VAN, V et al.Surface & coatings technology. 1994, Vol 68-69, pp 724-728, issn 0257-8972Conference Paper