au.\*:("WANG DNK")
Results 1 to 3 of 3
Selection :
REACTIVE SPUTTER ETCHING AND ITS APPLICATIONSWANG DNK; MAYDAN D; LEVINSTEIN HJ et al.1980; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1980; VOL. 23; NO 8; PP. 122-126; BIBL. 9 REF.Article
EFFECT OF GROWTH PARAMETERS ON THE CVD OF BORON NITRIDE AND PHOSPHORUS-DOPED BORON NITRIDEMURARKA SP; CHANG CC; WANG DNK et al.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 11; PP. 1951-1957; BIBL. 4 REF.Article
REACTIVE ION ETCHING OF SILICON OXIDES WITH AMMONIA AND TRIFLUOROMETHANE. THE ROLE OF NITROGEN IN THE DISCHARGESMOLINSKY G; TRUESDALE EA; WANG DNK et al.1982; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1982; VOL. 129; NO 5; PP. 1036-1040; BIBL. 12 REF.Article