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PROJECTILE-ENERGY DEPENDENCE AND LINE SHAPE OF AR-L AUGER SPECTRA FROM ARGON BOMBARDED SILICONWITTMAACK K.1979; PHYS. LETT. SECT. A; ISSN 0375-9601; NLD; DA. 1979; VOL. 74; NO 3-4; PP. 197-200; BIBL. 18 REF.Article

LOW ENERGY ION BEAM TRANSPORT THROUGH APERTURES.WITTMAACK K.1977; NUCL. INSTRUM. METHODS; NETHERL.; DA. 1977; VOL. 143; NO 1; PP. 1-6; BIBL. 17 REF.Article

IONIZATION MECHANISM OF H+ SPUTTERED FROM HYDROGENATED SILICONWITTMAACK K.1979; PHYS. REV. LETT.; ISSN 0031-9007; USA; DA. 1979; VOL. 43; NO 12; PP. 872-875; BIBL. 15 REF.Article

HIGH-SENSITIVITY DEPTH PROFILING OF ARSENIC AND PHOSPHORUS IN SILICON BY MEANS OF SIMS.WITTMAACK K.1976; APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 29; NO 9; PP. 552-554; BIBL. 22 REF.Article

BEAM FORMATION IN A TRIODE ION GUN.WITTMAACK K.1974; NUCL. INSTRUM. METHODS; NETHERL.; DA. 1974; VOL. 118; NO 1; PP. 99-113; BIBL. 30 REF.Article

PRIMARY-ION CHARGE COMPENSATION IN SIMS ANALYSIS OF INSULATORSWITTMAACK K.1979; J. APPL. PHYS.; USA; DA. 1979; VOL. 50; NO 1; PP. 493-497; BIBL. 16 REF.Article

PRE-EQUILIBRIUM VARIATION OF THE SECONDARY ION YIELD.WITTMAACK K.1975; INTERNATION. J. MASS SPECTROM. ION PHYS.; NETHERL.; DA. 1975; VOL. 17; NO 1; PP. 39-50; BIBL. 25 REF.Article

DESIGN AND PERFORMANCE OF QUADRUPOLE-BASED SIMS INSTRUMENTS: A CRITICAL REVIEWWITTMAACK K.1982; VACUUM; ISSN 0042-207X; GBR; DA. 1982; VOL. 32; NO 2; PP. 65-89; BIBL. 112 REF.Article

OXYGEN-CONCENTRATION DEPENDENCE OF SECONDARY ION YIELD ENHANCEMENTWITTMAACK K.1981; SURF. SCI.; ISSN 0039-6028; NLD; DA. 1981; VOL. 112; NO 1-2; PP. 168-180; BIBL. 41 REF.Article

ON THE MECHANISM OF CLUSTER EMISSION IN SPUTTERINGWITTMAACK K.1979; PHYS. LETTERS, A; NLD; DA. 1979; VOL. 69; NO 5; PP. 322-325; BIBL. 20 REF.Article

Impact and growth phenomena observed with sub-micrometer atmospheric aerosol particles collected on polished silicon at low coverageWITTMAACK, K.Atmospheric environment (1994). 2002, Vol 36, Num 24, pp 3963-3971, issn 1352-2310, 9 p.Article

IMPLICATIONS IN THE USE OF SPUTTERING FOR LAYER REMOVAL: THE SYSTEM AU ON SIBLANK P; WITTMAACK K.1979; RAD. EFFECTS; GBR; DA. 1979; VOL. 43; NO 3; PP. 105-110; BIBL. 18 REF.Article

DIATOMIC VERSUS ATOMIC SECONDARY ION EMISSION.WITTMAACK K; STAUDENMAIER G.1975; APPL. PHYS. LETTERS; U.S.A.; DA. 1975; VOL. 27; NO 6; PP. 318-320; BIBL. 28 REF.Article

DYNAMIC RANGE OF 106 IN DEPTH PROFILING USING SECONDARY-ION MASS SPECTROMETRYWITTMAACK K.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 37; NO 3; PP. 285-287; BIBL. 17 REF.Article

PRODUCTION OF MOLECULAR NOBLE GAS IONS IN A HOT CATHODE ION SOURCEWITTMAACK K.1979; J. VAC. SCI. TECHNOL.; ISSN 0022-5355; USA; DA. 1979; VOL. 16; PP. 1027-1032; BIBL. 19 REF.Article

RASTER SCANNING DEPTH PROFILING OF LAYER STRUCTURES.WITTMAACK K.1977; APPL. PHYS.; GERM.; DA. 1977; VOL. 12; NO 2; PP. 149-156; BIBL. 33 REF.Article

THE USE OF SECONDARY ION MASS SPECTROMETRY FOR STUDIES OF OXYGEN ADSORPTION AND OXIDATION.WITTMAACK K.1977; SURF. SCI.; NETHERL.; DA. 1977; VOL. 68; PP. 118-129; BIBL. 42 REF.; (INTERDISCIPLINARY SURF. SCI. CONF. 3. PROC.; YORK; 1977)Conference Paper

Towards a realistic description of the contribution of primary and secondary aerosols to ambient particle number and mass distributionsWITTMAACK, K.Journal of aerosol science. 2004, Vol 35, Num 5, pp 611-620, issn 0021-8502, 10 p.Article

Advanced evaluation of size-differential distributions of aerosol particlesWITTMAACK, K.Journal of aerosol science. 2002, Vol 33, Num 7, pp 1009-1025, issn 0021-8502Article

Abrupt reduction of the partial sputtering yield of copper in silicon due to beam induced oxidation and segregation = Réduction abrupte du rendement de pulvérisation partiel du cuivre dans le silicium due à l'oxydation induite par faisceau et à la ségrégationWITTMAACK, K.Applied physics letters. 1986, Vol 48, Num 20, pp 1400-1402, issn 0003-6951Article

Production of ions of the opposite charge in mass analysis using a quadrupole filter = Production d'ions de charge opposée dans l'analyse de masse utilisant un filtre quadripolaireWITTMAACK, K.International journal of mass spectrometry and ion processes. 1986, Vol 69, Num 2, pp 197-209, issn 0168-1176Article

DETERMINATION OF ION SOURCE PRESSURE FROM DISCHARGE CHARACTERISTICS.WITTMAACK K; WACH W.1977; NUCL. INSTRUM. METHODS; NETHERL.; DA. 1977; VOL. 143; NO 1; PP. 7-12; BIBL. 10 REF.Article

Mass resolved low-energy ion backscattering spectrometry at target-to-projectile mass ratios near unityWITTMAACK, K.Surface science. 1996, Vol 345, Num 1-2, pp 110-124, issn 0039-6028Article

Charge compensation in SIMS analysis of polymer foils using negative secondary ionsWITTMAACK, K.Surface and interface analysis. 1987, Vol 10, Num 6, pp 311-315, issn 0142-2421Article

AN AES-SIMS STUDY OF SILICON OXIDATION INDUCED BY ION OR ELECTRON BOMBARDMENTREUTER W; WITTMAACK K.1980; APPL. SURF. SCI.; NLD; DA. 1980; VOL. 5; NO 3; PP. 221-242; BIBL. 66 REF.Article

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