kw.\*:("X-ray lithography")
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Prospects for x-ray lithographyFLEMING, D; MALDONADO, J. R; NEISSER, M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2511-2515, issn 1071-1023Conference Paper
ACLV control in X-ray lithographyKRASNOPEROVA, A. A; RIPPSTEIN, R; PUISTO, D et al.SPIE proceedings series. 1998, pp 165-178, isbn 0-8194-2776-4Conference Paper
Study on X-ray mask distortion applying direct bonding to frame mountingMTISUI, S; ITOH, M; MOEL, A et al.Japanese journal of applied physics. 1993, Vol 32, Num 12B, pp 5924-5927, issn 0021-4922, 1Conference Paper
Vacuum behavior of the x-ray lithography sourceHALAMA, H. J; MURPHY, J. B.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 4, pp 2082-2084, issn 0734-2101, 2Conference Paper
Novel approach to zero-magnification x-ray mask replicationWELLS, G. M; KRASNOPEROVA, A; HAYTCHER, E. A et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3221-3223, issn 1071-1023Conference Paper
Synchrotron light for X-ray lithographyROBINSON, A. L.Science (Washington, D.C.). 1985, Vol 228, Num 4695, pp 39-40, issn 0036-8075Article
Demagnified projection printing by a new x-ray lithographic technique using no thin-film masksMATSUMURA, H; TANAKA, T.Applied physics letters. 1984, Vol 45, Num 1, pp 3-5, issn 0003-6951Article
Evaluation of a new X-ray stepper XRASUITA, M; MITSUI, S; SUMITANI, H et al.Microelectronic engineering. 2001, Vol 57-58, pp 17-21, issn 0167-9317Conference Paper
Dynamic characterization of step-induced vibrations of x-ray mask membranesSCHLAX, M. P; ENGELSTAD, R. L; LOVELL, E. G et al.SPIE proceedings series. 1998, pp 629-637, isbn 0-8194-2776-4Conference Paper
Photoacid generator study for a chemically-amplified negative resist for high resolution lithographyDENTINGER, P. M; KNAPP, K. G; REYNOLDS, G. W et al.SPIE proceedings series. 1998, pp 568-579, isbn 0-8194-2776-4Conference Paper
CXrL aligner : an experimental x-ray lithography system for quarter-micron feature devicesCHEN, G; WALLACE, J; NACHMAN, R et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3229-3234, issn 1071-1023Conference Paper
Proximity effect reduction in x-ray mask making using thin silicon dioxide layersRHEE, K. W; MA, D. I; PECKERAR, M. C et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3062-3066, issn 1071-1023Conference Paper
X-ray mask development based on SiC membrane and W absorberCHAKER, M; BOILY, S; HAGHIRI-GOSNET, A. M et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3191-3195, issn 1071-1023Conference Paper
X-ray lithography with micropinch soft X-ray sourceGUREY, A. E; POLUKHIN, S. N; SEMENOV, O. G et al.Experimentelle Technik der Physik. 1990, Vol 38, Num 5-6, pp 519-522, issn 0014-4924Conference Paper
Automatic mask aligment for X-ray microlithographyDOEMENS, G; MENGEL, P.Siemens Forschungs- und Entwicklungsberichte. 1984, Vol 13, Num 2, pp 43-47, issn 0370-9736Article
High contrast x-ray mask preparationONO, T; OZAWA, A.Journal of vacuum science and technology. A, vacuum, surfaces, and films. 1984, Vol 2, Num 1, pp 68-72Article
Stationary large area exposure in synchroton radiation lithography utilizing a new arrangement of magnets applied to the storage ringTANINO, H; HOH, K.Japanese journal of applied physics. 1983, Vol 22, Num 11, pp L718-L720, issn 0021-4922Article
Micro optical distance sensor fabricated by the LIGA processNAKAJIMA, H; RUTHER, P; MOHR, J et al.SPIE proceedings series. 1998, pp 106-112, isbn 0-8194-2972-4Conference Paper
Mixed proximity/holographic mask technology for 50nm VLSI by X-ray lithographyBURGE, R. E; KNAUER, J. N; YUAN, X.-C et al.SPIE proceedings series. 1998, pp 280-290, isbn 0-8194-2776-4Conference Paper
LIGA activity in TaiwanCHENG, Y.Microsystem technologies. 1996, Vol 2, Num 4, pp 157-161, issn 0946-7076Article
The development of SOR lithography technologyISHIHARA, S.NTT review. 1995, Vol 7, Num 4, pp 18-25, issn 0915-2334Article
Application of an x-ray stepper for subquarter micrometer fabricationYONG CHEN; HAGHIRI-GOSNET, A. M; DECANINI, D et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 3243-3247, issn 1071-1023Conference Paper
Characterization of chemically amplified resists for soft x-ray projection lithographyKUBIAK, G. D; KNEEDLER, E. M; HWANG, R. Q et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2593-2599, issn 1071-1023Conference Paper
Effect of acid diffusion on resolution of a chemically amplified resist in X-ray lithographyNAKAMURA, J; BAN, H; DEGUCHI, K et al.Japanese journal of applied physics. 1991, Vol 30, Num 10, pp 2619-2625, issn 0021-4922, 1Article
Coherent operation of sliding wiggler for stationary large area exposure in synchroton radiation lithographyTANINO, H; HOH, K.Japanese journal of applied physics. 1984, Vol 23, Num 1, issn 0021-4922, 131Article