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COMPACT REPETITIVELY PULSED EXCIMER LASERCOHN DB; CONLEY EE.1983; REVIEW OF SCIENTIFIC INSTRUMENTS; ISSN 0034-6748; USA; DA. 1983; VOL. 54; NO 2; PP. 250-251; BIBL. 2 REF.Article

EFFECT OF RARE-GAS DILUENTS ON THE PERFORMANCE OF AN XECL LASER PUMPED BY A HIGH-INTENSITY ELECTRON BEAMTISONE GC; HOFFMAN JM.1981; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1981; VOL. 39; NO 2; PP. 145-147; BIBL. 15 REF.Article

EFFICIENT SPECTRAL NARROWING OF A XECL TEA LASERBUFFA R; BURLAMACCHI P; SALIMBENI R et al.1983; JOURNAL OF PHYSICS D: APPLIED PHYSICS; ISSN 0022-3727; GBR; DA. 1983; VOL. 16; NO 7; PP. L125-L128; H.T. 1; BIBL. 8 REF.Article

LONG PULSE OPERATION OF DISCHARGE-EXCITED XECL LASERSHOGAN DC; BRUZZESE R; KEARSLEY AJ et al.1981; J. PHYS. D; ISSN 0022-3727; GBR; DA. 1981; VOL. 14; NO 10; PP. L157-L161; H.T. 2; BIBL. 4 REF.Article

XECL LASER OPERATION WITH LIQUID CHLORINE DONORS: AN EXPERIMENTAL INVESTIGATION ON THE GAS COMPOSITIONSALIMBENI R; MATERA M; VANNINI M et al.1981; OPT. COMMUN.; ISSN 0030-4018; USA; DA. 1981; VOL. 39; NO 1-2; PP. 75-78; BIBL. 10 REF.Article

IMPROVED PERFORMANCE OF THE MICROWAVE-PUMPED XECL LASERWISOFF PJK; MENSELSOHN AJ; HARRIS SE et al.1982; IEEE JOURNAL OF QUANTUM ELECTRONICS; ISSN 0018-9197; USA; DA. 1982; VOL. 18; NO 11; PP. 1839-1840; BIBL. 6 REF.Article

EXCIMER LASER TECHNOLOGYMACE PN.1981; OPT. ENG.; ISSN 0091-3286; USA; DA. 1981; VOL. 20; NO 6; PP. 935-940; BIBL. 14 REF.Article

A HIGH-POWER, NARROW LINEWIDTH XECL* OSCILLATORBOURNE OL; ALCOCK AJ.1983; APPLIED PHYSICS LETTERS; ISSN 0003-6951; USA; DA. 1983; VOL. 42; NO 9; PP. 777-779; BIBL. 18 REF.Article

EFFECT OF NITROGEN ON XEF (C->A) AND XE2CL LASER PERFORMANCESAUERBREY R; TITTEL FK; WILSON WL JR et al.1982; IEEE JOURNAL OF QUANTUM ELECTRONICS; ISSN 0018-9197; USA; DA. 1982; VOL. 18; NO 9; PP. 1336-1340; BIBL. 19 REF.Article

PICOSECOND AMPLIFICATION AND KINETIC STUDIES OF XECLCORKUM PB; TAYLOR RS.1982; IEEE JOURNAL OF QUANTUM ELECTRONICS; ISSN 0018-9197; USA; DA. 1982; VOL. 18; NO 11; PP. 1962-1975; BIBL. 57 REF.Article

MEASUREMENT OF LASING PERFORMANCE AND EFFICIENCY OF E-BEAM PUMPED XENON CHLORIDEMOODY SE; LEVIN LA; CENTER RE et al.1981; IEEE J. QUANTUM ELECTRON.; ISSN 0018-9197; USA; DA. 1981; VOL. 17; NO 9; PP. 1856-1861; BIBL. 17 REF.Article

ELECTRICAL EXCITATION OF AN XECL LASER USING MAGNETIC PULSE COMPRESSIONSMILANSKI I; BYRON SR; BURKES TR et al.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 40; NO 7; PP. 547-548; BIBL. 3 REF.Article

STUDY OF THE XECL LASER PUMPED BY A HIGH-INTENSITY ELECTRON BEAMTISONE GC; HOFFMAN JM.1982; IEEE J. QUANTUM ELECTRON.; ISSN 0018-9197; USA; DA. 1982; VOL. 18; NO 6; PP. 1008-1020; BIBL. 26 REF.Article

A WAVELENGTH SCANNABLE XECP OSCILLATOR-RING AMPLIFIER LASER SYSTEMPACALA TJ; MCDERMID IS; LAUDENSLAGER JB et al.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 40; NO 1; PP. 1-3; BIBL. 8 REF.Article

KINETIC MODEL FOR LONG-PULSE XECL LASER PERFORMANCELEVIN LA; MOODY SE; KLOSTERMAN EL et al.1981; IEEE J. QUANTUM ELECTRON.; ISSN 0018-9197; USA; DA. 1981; VOL. 17; NO 12; PART. 1; PP. 2282-2289; BIBL. 54 REF.Article

SHORT PULSE, X-RAY PREIONIZATION OF A HIGH PRESSURE XECL GAS DISCHARGE LASERSHIELDS H; ALCOCK AJ.1982; OPT. COMMUN.; ISSN 0030-4018; NLD; DA. 1982; VOL. 42; NO 2; PP. 128-132; BIBL. 28 REF.Article

MEASUREMENT OF HCL ELECTRON ATTACHMENT IN RELATION TO XECL LASER KINETICSKLIGLER D; ROZENBERG Z; ROKNI M et al.1981; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1981; VOL. 39; NO 4; PP. 319-321; BIBL. 15 REF.Article

PICOSECOND HIGH POWER EXTRACTION FROM AN UNSTABLE RESONATOR BASED INJECTIONLOCKED XECL LASERVARGHESE T.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 40; NO 2; PP. 127-129; BIBL. 9 REF.Article

ELECTRON BEAM PUMPED BROAD-BAND DIATOMIC AND TRIATOMIC EXCIMER LASERSTITTEL FK; MAROWSKY G; WILSON WL JR et al.1981; IEEE J. QUANTUM ELECTRON.; ISSN 0018-9197; USA; DA. 1981; VOL. 17; NO 12; PART. 1; PP. 2268-2281; BIBL. 70 REF.Article

SPECIAL FEATURES OF ELECTRON BEAM-EXCITED XECL-LASER GENERATIONBYCHKOV YI; LOSEV VF; MESYATS GA et al.1982; OPT. COMMUN.; ISSN 0030-4018; NLD; DA. 1982; VOL. 42; NO 4; PP. 278-280; BIBL. 15 REF.Article

A NOVEL ANALYTICAL DESIGN METHOD FOR DISCHARGE LASER ELECTRODE PROFILESSTAPPAERTS EA.1982; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1982; VOL. 40; NO 12; PP. 1018-1019; BIBL. 7 REF.Article

RARE GAS RECOVERY SYSTEMS FOR RARE GAS HALIDE LASERSKUTSCHKE KO; HACKETT PA; WILLIS C et al.1981; REV. SCI. INSTRUM.; ISSN 0034-6748; USA; DA. 1981; VOL. 52; NO 11; PP. 1655-1656; BIBL. 6 REF.Article

ACTIVE MODE LOCKING OF A XECL LASERREKSTEN G; VARGHESE T; MARGULIS W et al.1981; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1981; VOL. 39; NO 2; PP. 129-131; BIBL. 15 REF.Article

ELECTRICAL CIRCUIT DESIGN OF FAST-DISCHARGE SYSTEM FOR HIGH-POWER RARE-GAS HALIDE LASERSMAEDA M; NISHITARUMIZU T; MIYAZOE Y et al.1981; JPN. J. APPL. PHYS.; ISSN 0021-4922; JPN; DA. 1981; VOL. 20; NO 1; PP. 129-137; BIBL. 15 REF.Article

A RESISTIVELY STABILIZED XECL LASER OPERATING AT 200 HZFUJII K; KEARSLEY AJ; ANDREWS AJ et al.1981; IEEE J. QUANTUM ELECTRON.; ISSN 0018-9197; USA; DA. 1981; VOL. 17; NO 8; PP. 1315-1317; BIBL. 12 REF.Article

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