Dry laser cleaning of mechanically thin filmsBLOISI, F; BARONE, . A. C; VICARI, L et al.Applied surface science. 2004, Vol 238, Num 1-4, pp 121-124, issn 0169-4332, 4 p.Conference Paper

On using mixtures of liquids for ultrasonic cleaningNIEMCZEWSKI, B.Transactions of the Institute of Metal Finishing. 2005, Vol 83, pp 109-112, issn 0020-2967, 4 p., 2Article

Cavitation intensity of water solutions used in ultrasonic cleaning in comparison with water cavitation intensityNIEMCZEWSKI, B.Transactions of the Institute of Metal Finishing. 2006, Vol 84, pp 266-270, issn 0020-2967, 5 p., 5Article

Dust removal from shotblasting machines by means of medium-head wet dust-collectors with regulable hydraulic resistanceSTANEV, T; STOYANOVA, A; MITOVSKI, M et al.1983, Vol 32, Num 12, pp 534-538, issn 0025-455XArticle

Organic contaminants removal by oxygen ECR plasmaLEE, Chongmu; HYOUN WOO KIM; KIM, Sookjoo et al.Applied surface science. 2007, Vol 253, Num 7, pp 3658-3663, issn 0169-4332, 6 p.Article

Intensity of hydrodynamic movements induced by ultrasounds in ultrasonic cleaning in water solutionsNIEMCZEWSKI, B.Transactions of the Institute of Metal Finishing. 2006, Vol 84, pp 218-224, issn 0020-2967, 7 p., 4Article

Surface properties and self-cleaning ability of the fluorinated acrylate coatings modified with dodecafluoroheptyl methacrylate through two adding waysXIN YANG; LIQUN ZHU; YANG ZHANG et al.Applied surface science. 2014, Vol 295, pp 44-49, issn 0169-4332, 6 p.Article

Removal of nanoparticles from a silicon wafer using plasma shockwaves excited with a femtosecond laserPARK, Jung-Kyu; YOON, Ji-Wook; CHO, Sung-Hak et al.Applied surface science. 2012, Vol 258, Num 17, pp 6379-6383, issn 0169-4332, 5 p.Article

On the cleaning of monocrystalline metallic samples from impuritiesARABCZYK, W; NARKIEWICZ, U.Applied surface science. 2005, Vol 252, Num 1, pp 98-103, issn 0169-4332, 6 p.Conference Paper

Nettoyage de surfaces avec des détergents techniquesPRONYUK, V. G; BULATOV, G. S; SURAJKINA, L. V et al.Maslo-žirovaâ promyšlennost'. 1986, Num 11, pp 22-24, issn 0025-4649Article

Verbesserungen im Detail = Modern devices for cleaning techniquesIndustrie-Anzeiger. 1984, Vol 106, Num 51, pp 32-34, issn 0019-9036Article

Benefits of using chlorine dioxide as an alternative to hot-water sanitationAGIUS, George; BURKEEN, Stacey; MYNATT, Jim et al.Technical quarterly - Master Brewers Association of the Americas. 2004, Vol 41, Num 1, pp 42-44, issn 0743-9407, 3 p.Conference Paper

Carbon layers cleaning from inside of narrow gaps by a RF glow dischargeSTANCU, C; TEODORESCU, M; GALCA, A. C et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S435-S438, SUP2Conference Paper

Deposit weight density methodology for industrial boilersESMACHER, M. J.Materials performance. 1989, Vol 28, Num 1, pp 74-78, issn 0094-1492Article

Guidelines for printed circuit surface preparationNEAL, J. S.Electri.onics. 1984, Vol 30, Num 2, pp 27-30, issn 0745-4309Article

Observation of multibubble phenomena in an ultrasonic reactorCHAOQUN WU; NAKAGAWA, Noritoshi; SEKIGUCHI, Yasuhisa et al.Experimental thermal and fluid science. 2007, Vol 31, Num 8, pp 1083-1089, issn 0894-1777, 7 p.Article

A systematic approach to graffiti removal = Une approche systématique pour l'enlèvement des graffitisWEAVER, M.E.The Construction specifier. 1997, Vol 50, Num 6, pp 24-30, issn 0010-6925Article

Chemical foam cleaning as an efficient alternative for flux recovery in ultrafiltration processesGAHLEITNER, B; LODERER, C; SARACINO, C et al.Journal of membrane science (Print). 2014, Vol 450, pp 433-439, issn 0376-7388, 7 p.Article

Make a clean start for a good finish = Le nettoyage des pièces métalliques avant le traitement de surface = Die Reinigung von Metallteilen vor der OberflaechenveredelungDE VICQ, A.Metalworking Production. 1987, Vol 131, Num 7, issn 0026-1033, 54-55, 57Article

Environmentally benign single-wafer spin cLeaning using ultra-diluted HF/nitrogen jet spray without causing structural damage and material lossHATTORI, Takeshi; HIRANO, Hideki; OSAKA, Tsutomu et al.IEEE transactions on semiconductor manufacturing. 2007, Vol 20, Num 3, pp 252-258, issn 0894-6507, 7 p.Conference Paper

A critical review of syngas cleaning technologies : fundamental limitations and practical problemsSHARMA, S. D; DOLAN, M; PARK, D et al.Powder technology. 2008, Vol 180, Num 1-2, pp 115-121, issn 0032-5910, 7 p.Conference Paper

Particle adhesion and removal mechanisms in post-CMP cleaning processesBUSNAINA, Ahmed A; HONG LIN; MOUMEN, Naim et al.IEEE transactions on semiconductor manufacturing. 2002, Vol 15, Num 4, pp 374-382, issn 0894-6507, 9 p.Conference Paper

Best practices in disinfection of noncritical surfaces in the health care setting: Creating a bundle for successHAVILL, Nancy L.American journal of infection control. 2013, Vol 41, Num 5, issn 0196-6553, S26-S30, SUPArticle

Modeling and parameter analysis of plasma cleaningCHUAN LI; HSIEH, J. H; CHENG, Jui-Ching et al.Surface & coatings technology. 2006, Vol 200, Num 10, pp 3370-3375, issn 0257-8972, 6 p.Conference Paper

Les hautes pressionsLERBUD, G.Maintenance & entreprise (Paris). 1991, Num 441, pp 49-53, issn 1154-6433Article