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Results 1 to 25 of 9623

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Hard amorphous nanocomposite coatings with oxidation resistance above 1000°CMUSIL, J; VLCEK, J; ZEMAN, P et al.Advances in applied ceramics. 2008, Vol 107, Num 3, pp 148-154, 7 p.Article

Multi-target reactive sputtering- : A promising technology for large-area Pb(Zr,Ti)O3 thin film depositionSUCHANECK, G; LIN, W.-M; VIDYALTHI, V. S et al.Journal of the European Ceramic Society. 2007, Vol 27, Num 13-15, pp 3789-3792, issn 0955-2219, 4 p.Conference Paper

Successive deposition of layered titanium oxide/indium tin oxide films on unheated substrates by twin direct current magnetron sputteringWU, Kee-Rong; TING, Chieh-Hung; LIU, Wu-Chien et al.Thin solid films. 2006, Vol 500, Num 1-2, pp 110-116, issn 0040-6090, 7 p.Article

A study of Love wave devices in ZnO/Quartz and ZnO/LiTaO3 structuresCHANG, Ren-Chuan; CHU, Sheng-Yuan; HONG, Cheng-Shong et al.Thin solid films. 2006, Vol 498, Num 1-2, pp 146-151, issn 0040-6090, 6 p.Conference Paper

Nanostructured cobalt manganese ferrite thin films for gas sensor applicationSANDU, Izabela; PRESMANES, Lionel; ALPHONSE, Pierre et al.Thin solid films. 2006, Vol 495, Num 1-2, pp 130-133, issn 0040-6090, 4 p.Conference Paper

Physics of arcing, and implications to sputter depositionANDERS, André.Thin solid films. 2006, Vol 502, Num 1-2, pp 22-28, issn 0040-6090, 7 p.Conference Paper

A comparison of polyatomic ion deposited, RF magnetron sputtered and plasma polymer organosilicon filmsCHOUKOUROV, A; GRINEVICH, A; HANUS, J et al.Thin solid films. 2006, Vol 502, Num 1-2, pp 40-43, issn 0040-6090, 4 p.Conference Paper

Investigation of TiO2 based thin films deposited by reactive magnetron sputtering for use at high temperaturesHUNSCHE, B; VERGÖHL, M; RITZ, A et al.Thin solid films. 2006, Vol 502, Num 1-2, pp 188-192, issn 0040-6090, 5 p.Conference Paper

Hydrogen retention in carbon-tungsten co-deposition layer formed by hydrogen RF plasmaKATAYAMA, K; KAWASAKI, T; MANABE, Y et al.Thin solid films. 2006, Vol 506-07, pp 188-191, issn 0040-6090, 4 p.Conference Paper

Real time determination of film thickness homogeneity profiles of single silver layer products produced on an industrial magnetron lineANDERSON, C.Thin solid films. 2006, Vol 502, Num 1-2, pp 158-163, issn 0040-6090, 6 p.Conference Paper

The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputteringLEE, Jyh-Wei; TIEN, Shih-Kang; KUO, Yu-Chu et al.Thin solid films. 2006, Vol 494, Num 1-2, pp 161-167, issn 0040-6090, 7 p.Conference Paper

Characterization of rf sputtered TiOySz thin filmsLINDIC, Marie-Hélène; PECQUENARD, Brigitte; VINATIER, Philippe et al.Thin solid films. 2005, Vol 484, Num 1-2, pp 113-123, issn 0040-6090, 11 p.Article

Crystallization improvement of Ta2O5 thin films by the addition of water vaporHUANG, A. P; CHU, Paul K.Journal of crystal growth. 2005, Vol 274, Num 1-2, pp 73-77, issn 0022-0248, 5 p.Article

Effect of substrate temperature on structural, electrical and optical properties of Al-N Co-doped ZnO thin filmsGUODONG YUAN; LIPING ZHU; ZHIZHEN YE et al.Thin solid films. 2005, Vol 484, Num 1-2, pp 420-425, issn 0040-6090, 6 p.Article

Effects of sputtering pressure on compositions and structures of fresnoite thin filmsMANKANG ZHU; LIYING LIU; YUDONG HOU et al.Physica. B, Condensed matter. 2005, Vol 355, Num 1-4, pp 100-105, issn 0921-4526, 6 p.Article

Structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2×1 substrateBOCHAROV, Semyon; ZHANPING ZHANG; BEEBE, Thomas P et al.Thin solid films. 2005, Vol 471, Num 1-2, pp 159-165, issn 0040-6090, 7 p.Article

Microscopic investigations of aluminum nitride thin films grown by low-temperature reactive sputteringGUO, Q. X; YOSHITUGU, M; TANAKA, T et al.Thin solid films. 2005, Vol 483, Num 1-2, pp 16-20, issn 0040-6090, 5 p.Article

Microstructure and electronic investigations of carbon nitride films deposited by RF magnetron sputteringLAGRINI, A; CHARVET, S; BENLAHSEN, M et al.Thin solid films. 2005, Vol 482, Num 1-2, pp 41-44, issn 0040-6090, 4 p.Conference Paper

Carbon film deposition on polyethylene terephtalate by pulsed-plasma technologyLAIDANI, N; BARTALI, R; ANDERLE, M et al.Diamond and related materials. 2005, Vol 14, Num 3-7, pp 1023-1030, issn 0925-9635, 8 p.Conference Paper

Amorphous carbon films PACVD in CH4-CO2 under pulsed and continuous substrate bias conditionsGOTTARDI, G; LAIDANI, N; BARTALI, R et al.Diamond and related materials. 2005, Vol 14, Num 3-7, pp 1031-1035, issn 0925-9635, 5 p.Conference Paper

Structure of diamond-like carbon films containing transition metals deposited by reactive magnetron sputteringCORBELLA, C; ONCINS, G; GOMEZ, M. A et al.Diamond and related materials. 2005, Vol 14, Num 3-7, pp 1103-1107, issn 0925-9635, 5 p.Conference Paper

Room temperature growth of high quality ZnO thin film on sapphire substratesNAM HO KIM; HYOUN WOO KIM.Journal of materials science. 2004, Vol 39, Num 9, pp 3235-3236, issn 0022-2461, 2 p.Article

On the stoichiometry condition for the formation of cubic boron nitride films : Vacuum based science and technologyLE, Y. K; OECHSNER, H.Applied physics. A, Materials science & processing (Print). 2004, Vol 78, Num 5, pp 681-685, issn 0947-8396, 5 p.Article

Preparation of p-type ZnO films by A1 + N-codoping methodYE, Zhi-Zhen; ZHU-GE, Fei; LU, Jian-Guo et al.Journal of crystal growth. 2004, Vol 265, Num 1-2, pp 127-132, issn 0022-0248, 6 p.Article

Reducing the macroparticle content of cathodic arc evaporated TiN coatingsHARRIS, S. G; DOYLE, E. D; WONG, Y.-C et al.Surface & coatings technology. 2004, Vol 183, Num 2-3, pp 283-294, issn 0257-8972, 12 p.Article

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