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Progress in research and development on long length coated conductors in FujikuraKUTAMI, H; HAYASHIDA, T; HANYU, S et al.Physica. C. Superconductivity. 2009, Vol 469, Num 15-20, pp 1290-1293, issn 0921-4534, 4 p.Conference Paper

Broad fast neutral molecule beam sources for industrial-scale beam-assisted depositionGRIGORIEV, Sergei; MELNIK, Yuri; METEL, Alexander et al.Surface & coatings technology. 2002, Vol 156, Num 1-3, pp 44-49, issn 0257-8972Conference Paper

Influence of NHⁿ⁺ beam bombarding energy on structural characterization and cell attachment of CN_x coatingLI, D. J; ZHANG, S. J; NIU, L. F et al.Applied surface science. 2001, Vol 180, Num 3-4, pp 270-279, issn 0169-4332Article

Dependence of intrinsic stress and structure of ta-C film on ion energy and substrate temperature in model of the non-local thermoelastic peakKALINICHENKO, A. I; PEREPELKIN, S. S; STREL'NITSKIJ, V. E et al.Diamond and related materials. 2010, Vol 19, Num 7-9, pp 996-998, issn 0925-9635, 3 p.Conference Paper

A competition between (001) and (011) alignments in yttria stabilized zirconia thin films fabricated by ion beam assisted depositionWANG, Z; YAN, B. J; FENG, F et al.Physica. C. Superconductivity. 2010, Vol 470, Num 15-16, pp 622-625, issn 0921-4534, 4 p.Article

Critical conditions of epitaxy, mixing and sputtering growth on Cu(100) surface using molecular dynamicsHONG, Zheng-Han; HWANG, Shun-Fa; FANG, Te-Hua et al.Computational materials science. 2007, Vol 41, Num 1, pp 70-77, issn 0927-0256, 8 p.Article

Finite element modelling of stress development during deposition of ion assisted coatingsWARD, D. J; ARNELL, R. D.Thin solid films. 2002, Vol 420-21, pp 269-274, issn 0040-6090, 6 p.Conference Paper

Passivation properties of OLEDs with aluminum cathodes prepared by ion-beam-assisted deposition processSOON MOON JEONG; WON HOI KOO; SANG HUN CHOI et al.Applied surface science. 2005, Vol 241, Num 3-4, pp 352-361, issn 0169-4332, 10 p.Article

Positive magnetoresistance of Co-Cu film prepared by ion beam assisted depositionZENG, F; GEN, Q. W; GAO, Y et al.Applied surface science. 2005, Vol 245, Num 1-4, pp 39-44, issn 0169-4332, 6 p.Article

Improvement of Adhesion Strength of Fluoropolymer Thin Films by Vapor Deposition Polymerization : Recent Progress in Molecular and Organic DevicesSENDA, Kazuo; MATSUDA, Tsuyoshi; TANAKA, Kuniaki et al.IEICE transactions on electronics. 2013, Vol 96, Num 3, pp 374-377, issn 0916-8524, 4 p.Article

Buckling instability in amorphous carbon filmsZHU, X. D; NARUMI, K; NARAMOTO, H et al.Journal of physics. Condensed matter (Print). 2007, Vol 19, Num 23, issn 0953-8984, 236227.1-236227.6Article

Application of multi-ion beam enhanced depositionGUOQING LI; CUIYAN; TAO ZHANG et al.Surface & coatings technology. 2003, Vol 171, Num 1-3, pp 264-266, issn 0257-8972, 3 p.Article

Study on the early stage of thin film growth in pulsed beam deposition by kinetic Monte Carlo simulationZHANG, Q. Y; CHU, P. K.Surface & coatings technology. 2002, Vol 158-59, pp 247-252, issn 0257-8972Conference Paper

IBAD-multilayers on steel prepared by coil coatingWOLF, G. K; PREISS, G; MÜNZ, R et al.Surface & coatings technology. 2002, Vol 158-59, pp 125-130, issn 0257-8972Conference Paper

AFM observation of nanosized SiC dots prepared by ion beam depositionXU, Y; NARUMI, K; MIYASHITA, K et al.Surface and interface analysis. 2003, Vol 35, Num 1, pp 99-103, issn 0142-2421, 5 p.Article

Process Intensification in Vacuum Arc Deposition SetupsBARANOV, Oleg; ROMANOV, Maxim.Plasma processes and polymers (Print). 2009, Vol 6, Num 2, pp 95-100, issn 1612-8850, 6 p.Article

Sealing performance of thin amorphous carbon films formed by ion beam assisted deposition at low temperature for protection of aluminium against aggressive media : the influence of the ion energyVON RINGLEBEN, J; SUNDERMANN, Ch; MATSUTANI, T et al.Thin solid films. 2005, Vol 482, Num 1-2, pp 115-119, issn 0040-6090, 5 p.Conference Paper

The Role of Ion-assisted Deposition in PVDMA, Z. Q; FENG, C. B; TANG, X et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 698420.1-698420.4, issn 0277-786X, isbn 978-0-8194-7182-6, 1VolConference Paper

Preparation of hydroxyapatite layer by ion beam assisted simultaneous vapor depositionHAMDI, M; IDE-EKTESSABI, A.Surface & coatings technology. 2003, Vol 163-64, pp 362-367, issn 0257-8972, 6 p.Conference Paper

Formation of optical thin films by ion and plasma assisted techniquesRICHTER, F.Contributions to plasma physics (1985). 2001, Vol 41, Num 6, pp 549-561, issn 0863-1042Conference Paper

Pt/Ga/C and Pt/C composite nanowires fabricated by focused ion and electron beam induced depositionLI, P. G; JIN, A. Z; TANG, W. H et al.Physica status solidi. A. Applied research. 2006, Vol 203, Num 2, pp 282-286, issn 0031-8965, 5 p.Article

Photoluminescence characterization of β-FeSi₂ prepared by ion beam sputter deposition (IBSD) methodZHURAVLEV, A; YAMAMOTO, H; SHIMURA, K et al.Thin solid films. 2007, Vol 515, Num 22, pp 8149-8153, issn 0040-6090, 5 p.Conference Paper

IBAD―MgO buffer layers for coated conductors in the large-scale systemHANYU, S; TASHITA, C; HANADA, Y et al.Physica. C. Superconductivity. 2009, Vol 469, Num 15-20, pp 1364-1366, issn 0921-4534, 3 p.Conference Paper

A low temperature study of electron transport properties of tantalum nitride thin films prepared by ion beam assisted depositionLAL, K; GHOSH, P; BISWAS, D et al.Solid state communications. 2004, Vol 131, Num 7, pp 479-484, issn 0038-1098, 6 p.Article