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QUANTITATIVE EVALUATION OF PHOTORESIST PATTERNS IN THE 1-MU M RANGE.WIDMANN DW.1975; APPL. OPT.; U.S.A.; DA. 1975; VOL. 14; NO 4; PP. 931-934; BIBL. 5 REF.Article

SUR LA FORMATION DE FILMS DE RESINE PHOTOSENSIBLE PAR LA METHODE DE CENTRIFUGATIONPARAMONOV AI; PROKHOTSKIJ YU M.1976; ZH. NAUCH. PRIKL.; S.S.S.R.; DA. 1976; VOL. 21; NO 2; PP. 85-88; BIBL. 11 REF.Article

CONTRAST AND LINEARITY MODIFICATION IN PHOTO-RESISTS BY PHYSICOCHEMICAL MEANSTORRES CRUZ LH.1975; OPT. ACTA; G.B.; DA. 1975; VOL. 22; NO 12; PP. 963-972; ABS. ALLEMArticle

DETERMINATION OF REFRACTIVE INDEX CHANGES IN PHOTOSENSITIVE POLYMER FILMS BY AR OPTICAL WAVEGUIDE TECHNIQUE.WEAKLIEM HA; CHANNIN DJ; BLOOM A et al.1975; APPL. OPT.; U.S.A.; DA. 1975; VOL. 14; NO 3; PP. 560-561; BIBL. 4 REF.Article

ON THE SPECTRAL SENSITIZATION OF NEGATIVE AND POSITIVE PHOTORESISTS.SHANKOFF TA; TROZZOLO AM.1975; PHOTOGR. SCI. ENGNG; U.S.A.; DA. 1975; VOL. 19; NO 3; PP. 173-175; BIBL. 13 REF.Article

EXPOSURE REQUIREMENTS OF PHOTO-RESIST SYSTEMS.LAWSON LE.1975; IN: NON-SILVER PHOTOGR. PROCESSES. PROC. SYMP.; OXFORD; 1973; LONDON; ACAD. PRESS; DA. 1975; PP. 213-230Conference Paper

MILIEUX ORGANIQUES, SENSIBLES A LA LUMIERE, IRREVERSIBLES, POUR L'HOLOGRAPHIEKOZENKOV VM; BARACHEVSKIJ VA; GAPONENKO IE et al.1975; IN: VSES. SHK. GOLOGRAFII. 7. MATER.; LENINGRAD; 1975; LENINGRAD; INST. YAD. FIZ.; DA. 1975; PP. 455-495; BIBL. 7 P.Conference Paper

SIMPLE MATHEMATICAL MODEL FOR NEGATIVE PHOTORESIST BEHAVIOR.FREJLICH J; CLAIR JJ.1977; J. OPT. SOC. AMER.; U.S.A.; DA. 1977; VOL. 67; NO 1; PP. 92-96; BIBL. 3 REF.Article

ETUDE DE LA REALISATION DE LA LOI D'INTERCHANGEABILITE POUR LES POLYMERES PHOTOSENSIBLESGAEVA GL; LYALIKOV KS; VAVILOV AG et al.1976; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; S.S.S.R.; DA. 1976; VOL. 21; NO 6; PP. 456-458; BIBL. 3 REF.Article

SENSITIZATION OF DICHROMATED-POLY (VINYL ALCOHOL) TO VISIBLE LASER WAVELENGTHS.BLOOM A; BURKE WJ.1977; APPL. OPT.; U.S.A.; DA. 1977; VOL. 16; NO 10; PP. 2614-2615; BIBL. 5 REF.Article

ETUDE DES PHOTORESISTS COMME MILIEUX D'ENREGISTREMENT DES HOLOGRAMMESBOBROV ST; BRAJNIN YU I; TURKEVICH YU G et al.1979; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; SUN; DA. 1979; VOL. 24; NO 3; PP. 161-165; BIBL. 10 REF.Article

POUR LA RESTITUTION D'IMAGES VIDEO. L'ENREGISTREUR LASER. IL ALLIE RAPIDITE, HAUTE DEFINITION ET FIABILITE.DOARE M.1978; ELECTRON. APPL. INDUSTR.; FRA; DA. 1978; NO 251; PP. 48-49Article

CONTRIBUTION A L'ETUDE DE RESINES PHOTOSENSIBLES ET APPLICATIONS.PRILLARD JP.1974; ; S.L.; DA. 1974; PP. (60P.); H.T. 48; BIBL. 1 P. 1/2; (THESE DOCT. PHYS., MENTION OPT.; BESANCON)Thesis

ETUDE DES PHOTORESINES EN VUE DE LEURS APPLICATIONS EN OPTIQUE.TORRES CRUZ LH.1974; AO-CNRS-13078; FR.; DA. 1974; PP. 1-73; BIBL. 2 P.; (THESE DOCT. ING.; PARIS VI)Thesis

PHOTORESISTS. I. PHOTOPOLYMERIZATIONCLARK KG.1973; ELECTRON. COMPON.; G.B.; DA. 1973; VOL. 14; NO 12; PP. 553-554Serial Issue

MEASUREMENTS OF MODULATION TRANSFER FUNCTION VIA POSITIVE PHOTORESISTS AND THEIR CROSS SECTIONAL FEATURES.NAKASE M; MATSUMOTO Y.1977; JAP. J. APPL. PHYS.; JAP.; DA. 1977; VOL. 16; NO 11; PP. 2017-2022; BIBL. 7 REF.Article

THEORETICAL MODELING OF THE SIMULTANEOUS EXPOSURE AND DEVELOPMENT (SED) PROCESS OF A POSITIVE PHOTORESIST.TSANG WT.1977; APPL. OPT.; U.S.A.; DA. 1977; VOL. 16; NO 7; PP. 1918-1930; BIBL. 29 REF.Article

ETUDE DE LA REACTION DES MATERIAUX PHOTOSENSIBLES A BASE DE NAPHTOQUINONE DIAZIDE AVEC LES REVELATEURS NON IONIQUESGRIGOROVICH SL; NIKOL'SKIJ VG.1975; ZH. PRIKL. KHIM.; S.S.S.R.; DA. 1975; VOL. 48; NO 6; PP. 1307-1311; BIBL. 8 REF.Article

SUR LE MECANISME DE RETICULATION DE CAOUTCHOUC CYCLISE AVEC LES BISAZIDES. REMARQUES CONCERNANT L'UTILISATION DE LA METHODE DE DETERMINATION DE LA SENSIBILITE SPECTRALE DES PHOTORESISTSOLEJNIK AV; KARYAKINA LN.1974; ZH. NAUCH. PRIKL. FOTOGR. KINEMATOGR.; S.S.S.R.; DA. 1974; VOL. 19; NO 6; PP. 426-428; BIBL. 4 REF.Article

ETUDE DE LA PHOTOSENSIBILITE DU POLYCINNAMATE DE VINYLELYALIKOV KS; KOVALEVA KA; KAZBAN TP et al.1972; USP. NAUCH. FOTOGR.; S.S.S.R.; DA. 1972; VOL. 16; PP. 31-34; BIBL. 7 REF.Serial Issue

PRINCIPES PHYSICO-CHIMIQUES DU PROCESSUS PHOTOGRAPHIQUE SUR FILMS VESICULAIRES ET COMPOSES MACROMOLECULAIRES POUR CEUX-CILEVKOEV II; MAJBORODA VD; NAGORNYJ VI et al.1972; USP. NAUCH. FOTOGR.; S.S.S.R.; DA. 1972; VOL. 16; PP. 18-26; BIBL. 41 REF.Serial Issue

LINEARITY AND ENHANCED SENSITIVITY OF THE SHIPLEY AZ-1350B PHOTORESIST.LIVANOS AC; KATZIR A; SHELLAN JB et al.1977; APPL. OPT.; U.S.A.; DA. 1977; VOL. 16; NO 6; PP. 1633-1635; BIBL. 9 REF.Article

THERMAL EFFECTS ON THE PHOTORESIST AZ 1350J.DILL FH; SHAW JM.1977; I.B.M. J. RES. DEVELOP.; U.S.A.; DA. 1977; VOL. 21; NO 3; PP. 210-218; BIBL. 10 REF.Article

IL-22 : A critical mediator in mucosal host defenseAUJLA, S. J; KOLLS, J. K.Journal of molecular medicine (Berlin. Print). 2009, Vol 87, Num 5, pp 451-454, issn 0946-2716, 4 p.Article

Temporal associations between interleukin 22 and the extracellular domains of IL-22R and Il-10R2JING LI; TOMKINSON, Kathy N; DE ZUTTER, Gerard et al.International immunopharmacology. 2004, Vol 4, Num 5, pp 693-708, issn 1567-5769, 16 p.Article

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