Mask Shot Count Reduction Strategies in the OPC FlowWORD, James; MIZUUCHI, Keisuke; SAI FU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283F.1-70283F.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Flexible sparse and dense OPC algorithmsCOBB, Nick.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 2, 693-702Conference Paper

Comparison of OPC models with and without 3D-mask effectSER, Jung-Hoon; PARK, Tae-Hoon; JEONG, Moon-Gyu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401T.1-76401T.6, 2Conference Paper

Implementation of Multiple ROI with single FOV for advanced mask metrologyJEONG, Kyu-Hwa; FREZGHI, Hatsey; TAVASSOLI, Malahat et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72724D.1-72724D.9, 2Conference Paper

Layout Driven DNIRKAGEYAMA, Kiyoshi; YANAGISAWA, Kohei; KOBAYASHI, Atsushi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71223H.1-71223H.10, 2Conference Paper

Physical Simulation for Verification and OPC on Full Chip LevelSHIM, Seongbo; MOON, Seongho; KIM, Youngchang et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732I.1-79732I.9, 2Conference Paper

Enhancing OPC Model Stability and Predictability Using SEM Image ContoursEL-DIN HABIB, Mohamed Serag.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712244.1-712244.9, 2Conference Paper

Cell-Based OPC with Standard-Cell Fill InsertionLIANG DENG; CHAO, Kai-Yuan; HUA XIANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69251L.1-69251L.8, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Inverse lithography technology at chip scaleLIN, Benjamin; MING FENG SHIEH; LINYONG PANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 1, 615414.1-615414.11Conference Paper

A novel GDSII compression techniquePEREIRA, Mark; BARUAH, Barsha.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 2, 59923N.1-59923N.8Conference Paper

Fractal model applied wavefront aberration for the expression of local flareNAKASHIMA, Toshiharu; OGATA, Taro.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 615433.1-615433.10Conference Paper

Using reconfigurable OPC to improve quality and throughput of sub-100nm IC manufacturingMORSE, Richard D; LOPRESTI, Pat; CORBETT, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 61543D.1-61543D.8Conference Paper

Real-world impact of inverse lithography technologyHO, Jonathan; YAN WANG; LINYONG PANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 59921Z.1-59921Z.8Conference Paper

Incorporation of laser proximity correction into mask productionROSENBUSCH, A; UNRUH, J; KIRSCH, H et al.SPIE proceedings series. 1999, pp 513-522, isbn 0-8194-3468-X, 2VolConference Paper

Die to die and die to database capability analysis for advanced OPC inspectionCHEN, J. X; RUSSELL, D; TERHUNE, R et al.SPIE proceedings series. 1999, pp 626-634, isbn 0-8194-3468-X, 2VolConference Paper

Flare mitigation strategies in extreme ultraviolet lithographyKIM, Insung; MYERS, Alan; MELVIN, Lawrence S et al.Microelectronic engineering. 2008, Vol 85, Num 5-6, pp 738-743, issn 0167-9317, 6 p.Conference Paper

Efficient approach to improving pattern fidelity with multi OPC model and recipeDO, Munhoe; KANG, Jaehyun; CHOI, Jaeyoung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63494P.1-63494P.12, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Electrical Test Structures for the Characterization of Optical Proximity Correction : International Conference on Microelectronic Test StructuresTSIAMIS, Andreas; SMITH, Stewart; MCCALLUM, Martin et al.IEEE transactions on semiconductor manufacturing. 2012, Vol 25, Num 2, pp 162-169, issn 0894-6507, 8 p.Article

E-beam Shot Count Estimation at 32 nm HP and BeyondCHOI, Jin; SANG HEE LEE; NAM, Dongseok et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737917.1-737917.9Conference Paper

Empirical study of OPC metrology requirements for 32-nm node logicWARD, Brian S; ZAVYLOVA, Lena; DE BISSCHOP, Peter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712242.1-712242.10, 2Conference Paper

Evaluation of OPC Test Patterns using Parameter SensitivityWARD, Brian S.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243S.1-69243S.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Optimal Photomask Printability using Interactive OPC with a New Calibration MethodologyBAROUCH, Eytan; KNODLE, Stephen L.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071P.1-66071P.8, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Scanner-characteristics-aware OPC modeling and correctionTYMINSKI, Jacek K; QIAOLIN ZHANG; LUCAS, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210Z.1-65210Z.13, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Shot based MRC flow by using full chip MRC toolJI, Min-Kyu; JANG, Sung-Hoon; SON, Sung-Jun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66070V.1-66070V.11, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

eMET: 50keV electron multibeam Mask Exposure ToolKLEIN, Christof; KLIKOVITS, Jan; LOESCHNER, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700C.1-79700C.6Conference Paper