Photomask and next-generation lithography mask technology XV (16-18 April 2008, Yokohama, Japan)Horiuchi, Toshiyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2 v, 2, isbn 978-0-8194-7243-4 0-8194-7243-3Conference Proceedings

Mask image position correction for double patterning lithographySAITO, Masato; ITOH, Masamitsu; IKENAGA, Osamu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280D.1-70280D.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The Lithography Technology for the 32 nm HP and BeyondDUSA, Mircea; ARNOLD, Bill; FINDERS, Jo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702810.1-702810.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Hotspot management in which mask fabrication errors are consideredKARIYA, Mitsuyo; YAMANAKA, Eiji; YOSHIDA, Kenji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282U.1-70282U.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Influence of mask surface processing on CD-SEM imagingHAUPTMANN, Marc; ENG, Lukas M; RICHTER, Jan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702830.1-702830.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

UV NIL mask making and imprint evaluationFUJII, Akiko; SAKAI, Yuko; MOHRI, Hiroshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70281W.1-70281W.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Modeling mask pellicle effects for OPC/RETZAVYALOVA, Lena; HUA SONG; LUCAS, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283B.1-70283B.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask Shot Count Reduction Strategies in the OPC FlowWORD, James; MIZUUCHI, Keisuke; SAI FU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283F.1-70283F.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Mask process effect aware OPC modelingKOO, Kyoil; LEE, Sooryong; HONG, Minjong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283E.1-70283E.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Evaluation of Hotspot analysis flow using Mask ModelKAWASHIMA, Satoshi; HAYANO, Katsuya; KUWAHARA, Naoko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702838.1-702838.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The source of carbon contamination for EUV Mask productionKIM, Yongdae; LEE, Junsik; CHOI, Yongkyoo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70281U.1-70281U.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Verification of Mask Manufacturing Load Estimation (MiLE)NAGAMURA, Yoshikazu; NARUKAWA, Shogo; KATO, Masahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702837.1-702837.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Separable OPC Models for Computational LithographyLIU, Hua-Yu; QIAN ZHAO; WENJIN SHAO et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280X.1-70280X.11, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Advanced Mask Data Processing for 32nm and BeyondNOGATCH, John; HUNG, Dan; KONDEPUDY, Raghava et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702833.1-702833.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

IntenCD<^TM> : Mask Critical Dimension Variation MappingSAGIV, Amir; POLONSKY, Netanel; BOIMAN, Oren et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282X.1-70282X.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Model Based Short Range Mask Process CorrectionCHEN, G; WANG, J-S; BAI, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280G.1-70280G.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Application of Super-Diffraction-Lithography (SDL) for Advanced LogicNAKAO, Shuji; MAEJIMA, Shinroku; MITARAI, Yuko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283G.1-70283G.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Linewidth Roughness Characterization in Step and Flash Imprint LithographySCHMID, Gerard M; KHUSNATDINOV, Niyaz; BROOKS, Cynthia B et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280A.1-70280A.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Predictive Modeling of Lithography-Induced Linewidth VariationKAHNG, Andrew B; MUDDU, Swamy V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280M.1-70280M.14, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Photomask technology for 32nm node and beyondHIKICHI, Ryugo; ISHII, Hiroyuki; HOSOYA, Mono et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702805.1-702805.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Inspectability of PSM masks for the 32nm node using STARlight2+HUANG, Chain-Ting; CHENG, Yung-Feng; KUO, Shih-Ming et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282P.1-70282P.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

An extraction of repeating patterns from OPCed layout dataYOSHIHIRO, Fujimoto; SHOJI, Masahiro; KATO, Kokoro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702836.1-702836.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Impact of Illumination Source Symmetrization in OPCSTURTEVANT, John L; LE HONG; JAYARAM, Srividya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283M.1-70283M.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The Ultimate Chrome Absorber in Photomask-makingHASHIMOTO, Masahiro; IWASHITA, Hiroyuki; KOMINATO, Atsushi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702804.1-702804.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

MoSi absorber photomask for 32nm nodeKONISHI, Toshio; KOJIMA, Yosuke; TAKAHASHI, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702803.1-702803.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper