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ELECTRON RESISTS FOR THE MANUFACTURE OF INTEGRATED CIRCUITS.ROBERTS ED.1975; PHILIPS TECH. REV.; NETHERL.; DA. 1975; VOL. 35; NO 2-3; PP. 41-52; BIBL. 12 REF.Article

DETERMINATION DES CARACTERISTIQUES SENSITOMETRIQUES ET D'INFORMATION DES MATERIAUX PHOTOGRAPHIQUES INTERAGISSANT AVEC UN FAISCEAU ELECTRONIQUEKUPREJCHIK NP; PREDKO KG.1975; DOKL. AKAD. NAUK B.S.S.R.; S.S.S.R.; DA. 1975; VOL. 19; NO 2; PP. 121-124; BIBL. 7 REF.Article

THE PREPARATION AND CHARACTERIZATION OF A NEW, HIGHLY SENSITIVE, CROSSLINKING ELECTRON RESIST.BARTELT JL; FEIT ED.1975; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1975; VOL. 122; NO 4; PP. 541-544; BIBL. 11 REF.Article

TIME EVOLUTION OF DEVELOPED CONTOURS IN POLY-(METHYL METHACRYLATE) ELECTRON RESIST.GREENEICH JS.1974; J. APPL. PHYS.; U.S.A.; DA. 1974; VOL. 45; NO 12; PP. 5264-5268; BIBL. 16 REF.Article

CHANGE OF APPARENT SENSITIVITY OF AN ELECTRON RESIST DUE TO BACKING MATERIALSSAITOU N; MUNAKATA C; HONDA Y et al.1972; JAP. J. APPL. PHYS.; JAP.; DA. 1972; VOL. 11; NO 7; PP. 1061-1062; BIBL. 5 REF.Serial Issue

ELECTRON BEAM EXPOSURE OF NEGATIVE RESISTS.ERSOY O.1976; OPTIK; DTSCH.; DA. 1976; VOL. 45; NO 4; PP. 345-353; ABS. ALLEM.; BIBL. 7 REF.Article

DESIGN OF POLYMER RESISTS FOR ELECTRON LITHOGRAPHY. I.THOMPSON LF.1974; SOLID STATE TECHNOL.; U.S.A.; DA. 1974; VOL. 17; NO 7; PP. 27-40 (5P.); BIBL. 21 REF.Article

COMPUTER SIMULATION OF ELECTRON-BEAM RESIST PROFILESKYSER DF; PYLE R.1980; IBM J. RES. DEVELOP.; ISSN 0018-8646; USA; DA. 1980; VOL. 24; NO 4; PP. 426-437; BIBL. 19 REF.Article

ELECTRON SCATTERING AND LINE PROFILES IN NEGATIVE ELECTRON RESISTS.HEIDENREICH RD; BALLANTYNE JP; THOMPSON LF et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1284-1288; BIBL. 14 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

A STUDY OF ELECTRON BEAM EXSPOSURE OF POSITIVE RESISTS.ERSOY O.1975; OPTIK; DTSCH.; DA. 1975; VOL. 41; NO 5; PP. 479-487; ABS. ALLEM.; BIBL. 6 REF.Article

FE2O3. AN INORGANIC ELECTRON RESIST MATERIAL.KAMMLOTT GW; SINCLAIR WR.1974; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1974; VOL. 121; NO 7; PP. 929-932; BIBL. 10 REF.Article

ASPECTS OF ELECTRON RESIST EXPOSURE.WEBB D; HARDY CJ.1977; VACUUM; G.B.; DA. 1977; VOL. 27; NO 5-6; PP. 413-417; BIBL. 12 REF.Article

RECENT DEVELOPMENTS IN ELECTRON-RESIST EVALUATION TECHNIQUES.HATZAKIS M.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1276-1279; BIBL. 3 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

OPTIMIZATION OF EXPOSURE AND DEVELOPMENT PARAMETERS FOR ELECTRON-BEAM-WRITTEN PMMA STRUCTURESZEITLER HU; HIEKE EK.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 8; PP. 1430-1432; BIBL. 11 REF.Article

CROSS-SECTION PROFILES OF SINGLE-SCAN NEGATIVE ELECTRON-RESIST LINES.LIN LH.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1289-1293; BIBL. 8 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

POLY (BUTENE-1 SULFONE) - A HIGHLY SENSITIVE POSITIVE RESIST.BOWDEN MJ; THOMPSON LF; BALLANTYNE JP et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1294-1296; BIBL. 9 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

UTILISATION DES RESISTS EN MASQUAGE ELECTRONIQUE.DUBEE A.1974; VIDE; FR.; DA. 1974; NO 171 SUPPL.; PP. 15-24; BIBL. 10 REF.; (APPL. PROCESSUS ELECTRON. IONIQUES. IVE. CONGR. INT. AVISEM 74; TOULOUSE; 1974)Conference Paper

EMPIRICAL ELECTRON BACKSCATTER MODEL FOR THIN RESIST FILMS ON A SUBSTRATE.HEIDENREICH RD.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 4; PP. 1418-1425; BIBL. 11 REF.Article

MONOMOLECULAR RESISTS: A NEW CLASS OF HIGH RESOLUTION RESISTS FOR ELECTRON BEAM MICROLITHOGRAPHYBARRAUD A; ROSILIO C; RUAUDEL TEIXIER A et al.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 8; PP. 120-124; BIBL. 11 REF.Article

LES COUCHES MONOMOLECULAIRES: UNE NOUVELLE CLASSE D'ELECTRORESISTS ULTRAMINCES A HAUTE RESOLUTIONBARRAUD A; ROSILIO C.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 271-275; ABS. ENG; BIBL. 7 REF.Conference Paper

DISPOSITIF POUR LA MESURE DES CARACTERISTIQUES DES ECRANS CATHODOLUMINESCENTES ET DES PHOTOMATERIAUX SENSIBLES AUX ELECTRONSKUPREJCHIK NP; PREDKO KG.1974; PROBORY TEKH. EKSPER.; S.S.S.R.; DA. 1974; NO 5; PP. 205-207; BIBL. 7 REF.Article

A NEW INORGANIC ELECTRON RESIST OF HIGH CONTRAST.YOSHIKAWA A; OCHI O; NAGAI H et al.1977; APPL. PHYS. LETTERS; U.S.A.; DA. 1977; VOL. 31; NO 3; PP. 161-163; BIBL. 7 REF.Article

CURRENT CONTROL TECHNIQUE IN ELECTRON BEAM LITHOGRAPHYMUNAKATA C; KURODA K; TANIGUCHI Y et al.1980; J. PHYS. E; ISSN 0022-3735; GBR; DA. 1980; VOL. 13; NO 2; PP. 163-164; BIBL. 3 REF.Article

FACTORS AFFECTING ADHESION OF LITHOGRAPHIC MATERIALSMITTAL KL.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 5; PP. 89-100; (8 P.); BIBL. 27 REF.Article

IL-22 : A critical mediator in mucosal host defenseAUJLA, S. J; KOLLS, J. K.Journal of molecular medicine (Berlin. Print). 2009, Vol 87, Num 5, pp 451-454, issn 0946-2716, 4 p.Article

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