Pascal and Francis Bibliographic Databases

Help

Search results

Your search

au.\*:(%22VDE%2FVDI-Gesellschaft f%C3%BCr Mikroelektronik%2C Mikro- und Feinwerktechnik%22)

Filter

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Document Type [dt]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Publication Year[py]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Discipline (document) [di]

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Language

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Author Country

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Origin

A-Z Z-A Frequency ↓ Frequency ↑
Export in CSV

Results 1 to 25 of 1662065

  • Page / 66483
Export

Selection :

  • and

25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

Lithography Development and Research Challenges for the ≤ 22 nm Half-pitchWURM, Stefan.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747002.1-747002.11Conference Paper

EMLC 2006 (22nd European Mask and Lithography Conference)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6356-6, 1Vol, various pagings, isbn 0-8194-6356-6Conference Proceedings

Resolution capability of EBM-6000 and EBM-7000 for Nano-imprint templateYOSHITAKE, S; KAMIKUBO, T.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700H.1-74700H.7Conference Paper

Nanoimprint lithography techniques : an introductionSCHEER, H.-C.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810N.1-62810N.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

The status of LEEPL : Can it be an alternative solution?UTSUMI, Takao.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 628102.1-628102.13, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Mask Industry Assessment Trend AnalysisHUGHES, Greg; YUN, Henry.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747003.1-747003.11Conference Paper

Mask salvage in the age of capital contractionKIMMEL, Kurt R.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747004.1-747004.6Conference Paper

The magic of 4X mask reductionLERCEL, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810R.1-62810R.7, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

The task of EUV-reflectometry for HVM of EUV-masks: first stepsFARAHZADI, Azadeh; WIES, Christian; LEBERT, Rainer et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700E.1-74700E.7Conference Paper

Decomposition Algorithm for Double Patterning of Contacts and Via LayersEL-GAMAL, A; AL-IMAM, M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747008.1-747008.8Conference Paper

Extended Abbe approach for fast and accurate lithography imaging simulationsEVANSCHITZKY, P; ERDMANN, A; FÜHNER, T et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747007.1-747007.11Conference Paper

MeRiT® repair verification using in-die phase metrology Phame® BUTTGEREIT, Ute; BIRKNER, Robert; STELZNER, Robert et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747016.1-747016.7Conference Paper

Particle transport and reattachment on a mask surfaceNESLADEK, Pavel; OSBORNE, Steve; KOHL, Christian et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700B.1-74700B.11Conference Paper

Werkstoffe der Mikrotechnik: Basis für neue Produkte, Tagung, Berlin, 12.-13. Oktober 1989 = Les matériaux de la microtechnique. Bases pour les nouvelles productions = On the materials for the microtechnique. The bases for the new productionsVDI-Berichte. 1989, Num 796, issn 0083-5560, 383 p.Conference Proceedings

Programmable Lab-on-a-Chip System for single cell analysisTHALHAMMER, S.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7364, issn 0277-786X, isbn 978-0-8194-7638-8 0-8194-7638-2, 1Vol, 73640B.1-73640B.15Conference Paper

EMLC 2008 (24th European Mask and Lithography Conference)Behringer, Uwe F.W; Maurer, Wilhelm; Waelpoel, Jacques et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-6956-4, 1 v. (various pagings), isbn 978-0-8194-6956-4Conference Proceedings

MEDEA+ project 2T302 MUSCLE Masks through user's supply chain : leadership by excellenceTORSY, Andreas.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920A.1-67920A.8, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

VLSI circuits and systems IV (4-6 May 2009, Dresden, Germany)Riesgo, Teresa; Torre, Eduardo de la; Indrusiak, Leandro Soares et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7363, issn 0277-786X, isbn 978-0-8194-7637-1 0-8194-7637-4, 1Vol, various pagings, isbn 978-0-8194-7637-1 0-8194-7637-4Conference Proceedings

Autonomous Low-Noise System for Broadband Measurements of the Cosmic Microwave Background RadiationDEKOULIS, George.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7363, issn 0277-786X, isbn 978-0-8194-7637-1 0-8194-7637-4, 1Vol, 73631A.1-73631A.9Conference Paper

Nanotechnology IV (4-6 May 2009, Dresden, Germany)Wixforth, Achim; Lorke, Axel; Simmel, Friedrich C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7364, issn 0277-786X, isbn 978-0-8194-7638-8 0-8194-7638-2, 1Vol, various pagings, isbn 978-0-8194-7638-8 0-8194-7638-2Conference Proceedings

EMLC 2007 (23rd European Mask and Lithography Conference)Behringer, Uwe F.W; Maurer, Wilhelm; Waelpoel, Jacques et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6655-6, 1 v. (various pagings), isbn 978-0-8194-6655-6Conference Proceedings

Consequences of plasmonic effects in photomasksSCHELLENBERG, F. M; ADAM, K; MATTEO, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810B.1-62810B.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Plasma deposited and evaporated thin resists for template fabricationLAVALLEE, Eric; BEAUVAIS, Jacques; TAKAM MANGOUA, Bertrand et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810O.1-62810O.6, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

High Resolution Cell ProjectionWEIDENMUELLER, U; HAHMANN, P; LEMKE, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700P.1-74700P.9Conference Paper

  • Page / 66483