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Results 1 to 25 of 338824

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AN OVERVIEW OF E-BEAM MASK-MAKINGREYNOLDS JA.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 8; PP. 87-94; BIBL. 6 REF.Article

A REVIEW OF FINE-LINE LITHOGRAPHIC TECHNIQUES: PRESENT AND FUTUREWATTS RK; BRUNING JH.1981; SOLID STATE TECHNOL.; ISSN 0038-111X; USA; DA. 1981; VOL. 24; NO 5; PP. 99-105; BIBL. 42 REF.Article

NEUE LITHOGRAFIEVERFAHREN IN DER HALBLEITERTECHNIK = NOUVELLES METHODES LITHOGRAPHIQUES DANS LA TECHNIQUE DES SEMICONDUCTEURSHANNO S.1978; ELEKTRONIK; DEU; DA. 1978; VOL. 27; NO 11; PP. 59-66; BIBL. 9 REF.Article

PROCEEDINGS: MICROCIRCUIT ENGINEERING 81/INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY, LAUSANNE, SEPTEMBER 28-30, 1981OOSENBRUG A ED.1981; MICROCIRCUIT ENGINEERING 81. INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY/1981-09-28/LAUSANNE; CHE; LAUSANNE: SWISS FEDERAL INSTITUTE OF TECHNOLOGY; DA. 1981; 546 P.; 21 CMConference Proceedings

ZUR MIKROLITHOGRAPHIE FUER PLANARE BAUELEMENTE = LA REALISATION DE COMPOSANTS PLANAR PAR MICROLITHOGRAPHIEHERSENER J; RICKER T.1979; WISSENSCH. BER. A.E.G.-TELEFUNKEN; DEU; DA. 1979; VOL. 52; NO 1-2; PP. 139-147; ABS. ENG; BIBL. 32 REF.Article

POSITIVE TYPE RESISTS FOR MICROFABRICATIONKAKUCHI M; SUGAWARA S; SUKEGAWA K et al.1979; REV. ELECTR. COMMUNIC. LAB.; JPN; DA. 1979; VOL. 27; NO 11-12; PP. 1113-1118; BIBL. 8 REF.Article

HIGH BRIGHTNESS RING CATHODE ROTATING ANODE SOURCE FOR X-RAY LITHOGRAPHYWARDLY GA; MUNRO E; SCOTT RW et al.1977; COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, MICROELECTRONIQUE, OPTIQUE; FRA; DA. 1977; DGRST-7771946; PP. 217-220; ABS. FRE; BIBL. 9 REF.Conference Paper

RADIATION LEVELS ASSOCIATED WITH ADVANCED LITHOGRAPHIC TECHNIQUESGALLOWAY KF; MAYO S; ROITMAN P et al.1979; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1979; VOL. 126; NO 12; PP. 2245-2248; BIBL. 17 REF.Article

DEVICE PROCESSING USING THE TRILEVEL TECHNIQUEMORAN JM; MAYDAN D.1980; POLYM. ENG. SCI.; ISSN 0032-3888; USA; DA. 1980; VOL. 20; NO 16; PP. 1097-1101; BIBL. 9 REF.Article

INTERNATIONAL CONFERENCE ON MICROLITHOGRAPHY; MICROCIRCUIT ENGINEERING 82/COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE, GRENOBLE, 5-8 OCTOBRE 19821982; MICROCIRCUIT ENGINEERING 82. COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE/1982-10-05/GRENOBLE; FRA; GRENOBLE: COMITE DU COLLOQUE INTERNATIONAL SUR LA MICROLITHOGRAPHIE; DA. 1982; 395 P.; 30 CMConference Proceedings

PROCEEDINGS OF THE ELEVENTH ANNUAL SYMPOSIUM OF THE GREATER NEW YORK CHAPTER OF THE AVS ON ADVANCES IN MICROFABRICATIONMOGAB CJ ED.1980; J. VAC. SCI. TECHNOL.; ISSN 0022-5355; USA; DA. 1980; VOL. 17; NO 5; PP. 1146-1196; BIBL. DISSEM.Conference Paper

ELABORATORI E TECNOLOGIE AVANZATE VERSO I LIMITI DELLA MICROELETTRONICA. = CALCULATEURS ET TECHNOLOGIES AVANCEES VERS LES LIMITES DE LA MICROELECTRONIQUE1977; INGEGNERE; ITAL.; DA. 1977; VOL. 52; NO 11; PP. 463-466Article

POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHYYONEDA Y; KITAMURA K; NAITO J et al.1980; POLYM. ENG. SCI.; ISSN 0032-3888; USA; DA. 1980; VOL. 20; NO 16; PP. 1110-1114; BIBL. 6 REF.Article

MICROLITHOGRAPHYDECKERT C.1980; CIRCUITS MANUF.; USA; DA. 1980; VOL. 20; NO 7; PP. 39-54; 13 P.; BIBL. 32 REF.Article

LITHOGRAFIETECHNIKEN FUER HOECHST-INTEGRIERTE SCHALTUNGEN = TECHNIQUES LITHOGRAPHIQUES POUR CIRCUITS FORTEMENT INTEGRESSCHAUMBURG H.1979; MESSEN U. PRUEFEN; DEU; DA. 1979; NO 10; PP. 767-771; (3 P.)Article

BASIC TECHNOLOGY FOR VLSI. IITARUI Y.1980; IEEE TRANS. ELECTRON. DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 8; PP. 1321-1331; BIBL. 26 REF.Article

LITHOGRAPHY CHASES THE INCREDIBLE SHRINKING LINELYMAN J.1979; ELECTRONICS; USA; DA. 1979; VOL. 52; NO 8; PP. 105-116Article

Deposition mechanisms in Langmuir-Blodgett filmsPETERSON, I. R; RUSSELL, G. J.British polymer journal. 1985, Vol 17, Num 4, pp 364-367, issn 0007-1641Article

X-RAY OPTICS. APPLICATIONS TO SOLIDS.1977; TOPICS APPL. PHYS.; GERM.; DA. 1977; VOL. 22; PP. (237P.); BIBL. DISSEM.; ISBN 3540084622Serial Issue

CONDITIONS D'UTILISATION D'UNE SOURCE DE RAYONS X PRODUITS PAR UN RAYON LASER EN LITHOGRAPHIE DE CONTACTBOKOV YU S; KAS'YANOV YU S; KOROBKIN VV et al.1982; Z. TEH. FIZ.; ISSN 0044-4642; SUN; DA. 1982; VOL. 52; NO 3; PP. 538-539; BIBL. 6 REF.Article

ELECTRON BEAM AND X-RAY LITHOGRAPHY UPDATE.PIWCZYK BP.1978; ELECTRON. PACKAG. PRODUCT.; U.S.A.; DA. 1978; VOL. 18; NO 5; PP. 36-51 (10P.); BIBL. 18 REF.Article

ENDUITS SENSIBLES AUX RX POUR LA LITHOGRAPHIE AU-DESSOUS DU MICRONALEKSANDROV YU M; VALIEV KA; VELIKOV LV et al.1983; MIKROELEKTRONIKA; ISSN 0544-1269; SUN; DA. 1983; VOL. 12; NO 1; PP. 3-10; BIBL. 12 REF.Article

X-RAY LITHOGRAPHYWATTS RK.1979; SOLID STATE TECHNOL.; USA; DA. 1979; VOL. 22; NO 5; PP. 68-82; (5 P.); BIBL. 21 REF.Article

ELECTRON-BEAM EXPOSURE SYSTEMS PROVIDE BETTER QUALITY MASKS FASTER.MIYAUCHI S.1978; J. ELECTRON. ENGNG; JAP.; DA. 1978; NO 135; PP. 60-62Article

REPLICATION OF 175-A LINES AND SPACES IN POLYMETHYLMETHACRYLATE USING X-RAY LITHOGRAPHYFLANDERS DC.1980; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1980; VOL. 36; NO 1; PP. 93-96; BIBL. 18 REF.Article

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