Increasing of the EUV resist's sensitivity
- Author
- KITAI, M. S1 ; SOROKA, A. M2 ; RUDOI, I. G3
[1] Institute on Laser Information Technologies of Russian Academy of Sciences; Pioneskaya str., 2, Troitsk, 142190, Moscow Region, Russian Federation
[2] JSC Innovation-manufacturing Complex Besedy, Moscow Region, Russian Federation
[3] JSC MagAlTech, Moscow, Russian Federation - Conference title
- Fundamentals of laser-assisted micro- and nanotechnologies 2010 (5-8 July 2010, St. Petersburg, Russian Federation)
- Conference name
- Fundamentals of laser-assisted micro- and nanotechnologies (St. Petersburg 2010)
- Author (monograph)
- Veiko, Vadim P (Editor); Vartanyan, Tigran A (Editor)
SPIE, United States (Organiser of meeting)
St. Petersburg State University of Information technologies, Mechanics and Optics, Russian Federation (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7996 ; 799612.1-799612.10 ; ref : 16 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8569-4
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- Russian
- Keyword (fr)
- Application laser Lithographie Polymère Rayonnement UV extrême 0130C 4262
- Keyword (en)
- Laser beam applications Lithography Polymers Extreme ultraviolet radiation
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B62 Biological and medical applications
- Discipline
- Physics : optics Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24106466
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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