TSOM Method for Semiconductor Metrology
- Auteur
- ATTOTA, Ravikiran1 ; DIXSON, Ronald G1 ; KRAMAR, John A1 ; POTZICK, James E1 ; VLADAR, András E1 ; BUNDAY, Benjamin2 ; NOVAK, Erik3 ; RUDACK, Andrew2
[1] National Institute of Standards and Technology, Gaithersburg, MD 20899, United States
[2] SEMATECH, Albany, NY 12203, United States
[3] Bruker Nano Surfaces Division, Tucson, AZ 85756, United States - Titre de la conférence
- Metrology, inspection, and process control for microlithography XXV (28 February-3 March 2011, San Jose, [California], United States)
- Nom de la conférence
- Metrology, inspection, and process control for microlithography (25 ; San Jose CA 2011)
- Auteur (monographie)
- Raymond, Christopher J (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971 ; 79710T.1-79710T.15 ; 2 ; ref : 19 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8530-4
- Domaine scientifique
- Electronics; Metrology and instrumentation; Optics; Physics
- Editeur
- SPIE, Bellingham, Wash
- Pays de publication
- United States
- Type de document
- Conference Paper
- Langue
- English
- Mot clé (fr)
- Analyse sensibilité Commande processus Couche mince Dispositif microélectromécanique Echelle nanométrique Fabrication industrielle Interconnexion Lithographie Masque Mesure rugosité Microscope optique Microscopie force atomique Microscopie optique balayage Microscopie optique Microscopie électronique balayage Mode transmission Méthode mesure Nanoparticule Photolithographie Stockage donnée Taille critique 0130C 0779L 0790 4282C 8585 Nanométrologie Photonique
- Mot clé (en)
- Sensitivity analysis Process control Thin films Microelectromechanical device Nanometer scale Manufacturing Interconnections Lithography Masks Roughness measurement Optical microscopes Atomic force microscopy Scanning light microscopy Optical microscopy Scanning electron microscopy Transmission mode Measuring methods Nanoparticles Photolithography Data storage Critical size Nanometrology Photonics
- Mot clé (es)
- Dispositivo microelectromecánico Medición rugosidad Modo transmisión Almacenamiento datos
- Classification
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B00 Generalites / 001B00A Communication, éducation, histoire et philosophie / 001B00A30 Littérature et publications en physique / 001B00A30C Actes de congrès
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B00 Generalites / 001B00G Instruments, appareillage, composants et techniques communs à plusieurs branches de la physique et de l'astronomie / 001B00G79 Microscopes à champ proche, composants et techniques / 001B00G79L Microscopes à force atomique
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B00 Generalites / 001B00G Instruments, appareillage, composants et techniques communs à plusieurs branches de la physique et de l'astronomie / 001B00G90 Divers
- Pascal
- 001 Sciences exactes et technologie / 001D Sciences appliquees / 001D03 Electronique / 001D03G Circuits électriques, optiques et optoélectroniques / 001D03G02 Propriétés des circuits / 001D03G02C Circuits optiques et optoélectroniques / 001D03G02C1 Optique intégrée. Fibres et guides d'onde optiques
- Discipline
- Electronics Metrology Theoretical physics
- Provenance
- Inist-CNRS
- Base de données
- PASCAL
- Identifiant INIST
- 24459877
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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