Hexamethyldisiloxane thin films as sensitive coating for quartz crystal microbalance based volatile organic compounds sensors
- Auteur
- BOUTAMINE, M1 ; BELLEL, A1 ; SAHLI, S2 ; SEGUI, Y3 ; RAYNAUD, P3
[1] Laboratoire des Etudes de Matériaux d'Electronique pour Applications Médicales (LEMEAMED), Faculté des Sciences de la Technologie, Université Constantine 1, Constantine 25000, Algeria
[2] Laboratoire de Microsystèmes et Instrumentation (LMI), Faculté des Sciences de la Technologie, Université Constantine 1, Constantine 25000, Algeria
[3] Laboratoire Plasma et Conversion de l'Energie (LAPLACE), Université Paul Sabatier, 118 Route de Narbonne, 31062 Toulouse, France - Source
Thin solid films. 2014, Vol 552, pp 196-203, 8 p ; ref : 31 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Domaine scientifique
- Crystallography; Metallurgy, welding; Condensed state physics
- Editeur
- Elsevier, Amsterdam
- Pays de publication
- Netherlands
- Type de document
- Article
- Langue
- English
- Mot clé auteur
- Hexamethyldisiloxane Plasma polymerization Quartz crystal microbalance Sensor Volatile organic compounds
- Mot clé (fr)
- Aire superficielle Angle contact Benzène Capteur Composition chimique Composition surface Composé méthylé Composé organique volatil Couche mince Déplacement fréquence Déplacement raie Dépôt plasma Ethanol Facteur réflexion Microbalance quartz Microscopie force atomique Microscopie électronique balayage Morphologie surface Mouillabilité Mélange gaz Méthanol Polymérisation ionique Processus réversible Revêtement Rugosité Réflexion totale atténuée Spectre réflexion Spectrométrie transformée Fourier Vibration 0707D 5277D 6855J 8115J Hexaméthyldisiloxane
- Mot clé (en)
- Surface area Contact angle Benzene Sensors Chemical composition Surface composition Methyl compounds Volatile organic compound Thin films Frequency shift Spectral line shift Plasma deposition Ethanol Reflectivity Quartz microbalance Atomic force microscopy Scanning electron microscopy Surface morphology Wettability Gas mixtures Methanol Ionic polymerization Reversible processes Coatings Roughness Attenuated total reflection Reflection spectrum Fourier transform spectroscopy Vibrations
- Mot clé (es)
- Compuesto orgánico volátil Desplazamiento frecuencia Microbalanza cuarzo Polimerización iónica Espectro reflexión
- Classification
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B00 Generalites / 001B00G Instruments, appareillage, composants et techniques communs à plusieurs branches de la physique et de l'astronomie / 001B00G07 Techniques et équipements généraux / 001B00G07D Capteurs (chimiques, optiques, électriques, de mouvement, de gaz, etc.); télédétection
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B50 Physique des gaz, des plasmas et des decharges electriques / 001B50B Physique des plasmas et décharges électriques / 001B50B77 Applications des plasmas / 001B50B77D Implantation ionique et dépôt par plasma
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B60 Etat condense: structure, proprietes mecaniques et thermiques / 001B60H Surfaces et interfaces; couches minces et trichites (structure et propriétés non électroniques) / 001B60H55 Structure et morphologie de couches minces / 001B60H55J Structure et morphologie; épaisseur
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B80 Domaines interdisciplinaires: science des materiaux; rheologie / 001B80A Science des matériaux / 001B80A15 Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie / 001B80A15J Dépôt assisté par faisceaux électroniques et ioniques; placage ionique
- Discipline
- Metrology Physics and materials science Physics of condensed state : structure, mechanical and thermal properties Physics of gases, plasmas and electric discharges
- Provenance
- Inist-CNRS
- Base de données
- PASCAL
- Identifiant INIST
- 28250280
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2013.12.016 
https://dx.doi.org/10.1016/j.tsf.2013.12.016
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