Flash lamp annealing of spray coated films containing oxidized or hydrogen terminated silicon nanoparticles
- Auteur
- SEIDEL, Falko1 ; TOADER, Iulia G1 ; BUSCHBECK, Roy4 ; HIETSCHOLD, Michael5 ; LANG, Heinrich4 ; MEHRING, Michael3 ; BAUMANN, Reinhard2 ; ZAHN, Dietrich R. T1 ; KOTH, Stephan2 ; FRITZSCHE, Ronny3 ; SCHÄFER, Philipp1 ; BÜLZ, Daniel1 ; BÜCHTER, Benjamin3 ; GORDAN, Ovidiu D1 ; FREITAG, Hans1 ; JAKOB, Alexander4
[1] Semiconductor Physics, Technische Universität Chemnitz, 09107 Chemnitz, Germany
[2] Institute for Print and Media Technology, Technische Universität Chemnitz, 09107 Chemnitz, Germany
[3] Coordination Chemistry, Technische Universität Chemnitz, 09107 Chemnitz, Germany
[4] Inorganic Chemistry, Technische Universität Chemnitz, 09107 Chemnitz, Germany
[5] Solid Surface Analysis, Technische Universität Chemnitz, 09107 Chemnitz, Germany - Source
Thin solid films. 2014, Vol 562, pp 282-290, 9 p ; ref : 39 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Domaine scientifique
- Crystallography; Metallurgy, welding; Condensed state physics
- Editeur
- Elsevier, Amsterdam
- Pays de publication
- Netherlands
- Type de document
- Article
- Langue
- English
- Mot clé auteur
- Atomic force microscopy Flash lamp annealing In-line spectroscopic ellipsometry Photovoltaic Raman spectroscopy Scanning electron microscopy Silicon nanoparticle Spray coating
- Mot clé (fr)
- Acide fluorhydrique Atmosphère contrôlée Couche mince Croissance film Dispersion Dispositif photovoltaïque Dépôt projection Ellipsométrie spectroscopique Etat surface Ethanol Facteur réflexion Microscopie force atomique Microscopie force balayage Microscopie électronique balayage Nanomatériau Nanoparticule Oxydation Procédé dépôt Recuit Rugosité Silicium Spectre réflexion Spectrométrie Raman Spectrométrie transformée Fourier Terminaison surface 6855A 6855J 8107 8115R Substrat Molybdène
- Mot clé (en)
- Hydrofluoric acid Controlled atmospheres Thin films Film growth Dispersions Photovoltaic cell Spray coatings Spectroscopic ellipsometry Surface states Ethanol Reflectivity Atomic force microscopy Scanning force microscopy Scanning electron microscopy Nanostructured materials Nanoparticles Oxidation Deposition process Annealing Roughness Silicon Reflection spectrum Raman spectroscopy Fourier transform spectroscopy Surface termination
- Mot clé (es)
- Dispositivo fotovoltaico Elipsometría espectroscópica Procedimiento revestimiento Espectro reflexión
- Classification
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B60 Etat condense: structure, proprietes mecaniques et thermiques / 001B60H Surfaces et interfaces; couches minces et trichites (structure et propriétés non électroniques) / 001B60H55 Structure et morphologie de couches minces / 001B60H55J Structure et morphologie; épaisseur
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B80 Domaines interdisciplinaires: science des materiaux; rheologie / 001B80A Science des matériaux / 001B80A07 Nanomatériaux et nanostructures : fabrication et caractèrisation / 001B80A07Z Divers
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B80 Domaines interdisciplinaires: science des materiaux; rheologie / 001B80A Science des matériaux / 001B80A15 Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie / 001B80A15A Théorie et modèles de la croissance de films
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B80 Domaines interdisciplinaires: science des materiaux; rheologie / 001B80A Science des matériaux / 001B80A15 Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie / 001B80A15R Techniques de revêtement par pulvérisation
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Provenance
- Inist-CNRS
- Base de données
- PASCAL
- Identifiant INIST
- 28538631
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2014.04.081 
https://dx.doi.org/10.1016/j.tsf.2014.04.081
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