Deposition of cobalt and nickel sulfide thin films from thio- and alkylthio-urea complexes as precursors via the aerosol assisted chemical vapour deposition technique
- Auteur
- MGABI, L. P1 ; DLADLA, B. S1 ; MALIK, M. A2 ; GARJE, Shivram S3 ; AKHTAR, J4 ; REVAPRASADU, N1
[1] Department of Chemistry, University ofZululand, Private bag X1001 KwaDlangezwa, 3880, South Africa
[2] School of Chemistry, The University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
[3] Department of Chemistry, University of Mumbai, Vidyanagari, Santacruz (East), Mumbai 400098, India
[4] Nanoscience and Materials Synthesis Lab, Department of Physics, COMSATS, Institute of Information Technology (CIIT), Chak shahzad, Islamabad, Pakistan - Source
Thin solid films. 2014, Vol 564, pp 51-57, 7 p ; ref : 27 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Domaine scientifique
- Crystallography; Metallurgy, welding; Condensed state physics
- Editeur
- Elsevier, Amsterdam
- Pays de publication
- Netherlands
- Type de document
- Article
- Langue
- English
- Mot clé auteur
- Aerosol-assisted chemical vapor deposition Nickel cobalt sulfide Thin films
- Mot clé (fr)
- Analyse Fourier Aérosol Cobalt Complexe alkylthio Couche mince Cristallinité Diffraction RX Dépôt chimique phase vapeur Ligand Microscopie électronique balayage Morphologie Nickel Particule sphérique Précurseur Spectrométrie transformée Fourier Sulfure Thermogravimétrie Thiourée Thiourées Thrombocyte Urée 6855J 8115G
- Mot clé (en)
- Fourier analysis Aerosols Cobalt Alkylthio complex Thin films Crystallinity XRD CVD Ligands Scanning electron microscopy Morphology Nickel Spherical particle Precursor Fourier transform spectroscopy Sulfides Thermogravimetry Thiourea Thioureas Blood platelets Urea
- Mot clé (es)
- Complejo alquiltio Cristalinidad Partícula esférica
- Classification
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B60 Etat condense: structure, proprietes mecaniques et thermiques / 001B60H Surfaces et interfaces; couches minces et trichites (structure et propriétés non électroniques) / 001B60H55 Structure et morphologie de couches minces / 001B60H55J Structure et morphologie; épaisseur
- Pascal
- 001 Sciences exactes et technologie / 001B Physique / 001B80 Domaines interdisciplinaires: science des materiaux; rheologie / 001B80A Science des matériaux / 001B80A15 Méthodes de dépôt de films et de revêtements; croissance de films et épitaxie / 001B80A15G Dépôt chimique en phase vapeur (incluant le cvd activé par plasma, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Provenance
- Inist-CNRS
- Base de données
- PASCAL
- Identifiant INIST
- 28601504
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2014.04.086 
https://dx.doi.org/10.1016/j.tsf.2014.04.086
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