Lithographic molding: a convenient route to structures with sub-micrometer dimensions
- Author
- WILBUR, J. L; KIM, E; XIA, Y; WHITESIDES, G. M
Harvard univ., dep. chemistry, Cambridge MA 02138, United States - Source
Advanced materials (Weinheim). 1995, Vol 7, Num 7, pp 649-652 ; ref : 28 ref
- ISSN
- 0935-9648
- Scientific domain
- Chemistry; Electronics; Physics; Polymers, paint and wood industries
- Publisher
- Wiley, Weinheim
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Keyword (fr)
- Autoassemblage Couche monomoléculaire Elastomère Etude expérimentale Fabrication microélectronique Formation motif Lithographie Microscopie électronique balayage Moulage Photolithographie Processus fabrication Siloxane(diméthyl) polymère Nanotechnologie
- Keyword (en)
- Autoassembly Monolayers Elastomers Experimental study Microelectronic processing Patterning Lithography Scanning electron microscopy Molding Photolithography Production process Dimethylsiloxane polymer Nanotechnology
- Keyword (es)
- Autoensamble Estudio experimental Formacíon motivo Proceso fabricación Siloxano(dimetil) polímero
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3594693
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/adma.19950070710 
https://dx.doi.org/10.1002/adma.19950070710
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