Lithographic molding: a convenient route to structures with sub-micrometer dimensions
- Auteur
- WILBUR, J. L; KIM, E; XIA, Y; WHITESIDES, G. M
Harvard univ., dep. chemistry, Cambridge MA 02138, United States - Source
Advanced materials (Weinheim). 1995, Vol 7, Num 7, pp 649-652 ; ref : 28 ref
- ISSN
- 0935-9648
- Domaine scientifique
- Chemistry; Electronics; Physics; Polymers, paint and wood industries
- Editeur
- Wiley, Weinheim
- Pays de publication
- Germany
- Type de document
- Article
- Langue
- English
- Mot clé (fr)
- Autoassemblage Couche monomoléculaire Elastomère Etude expérimentale Fabrication microélectronique Formation motif Lithographie Microscopie électronique balayage Moulage Photolithographie Processus fabrication Siloxane(diméthyl) polymère Nanotechnologie
- Mot clé (en)
- Autoassembly Monolayers Elastomers Experimental study Microelectronic processing Patterning Lithography Scanning electron microscopy Molding Photolithography Production process Dimethylsiloxane polymer Nanotechnology
- Mot clé (es)
- Autoensamble Estudio experimental Formacíon motivo Proceso fabricación Siloxano(dimetil) polímero
- Classification
- Pascal
- 001 Sciences exactes et technologie / 001D Sciences appliquees / 001D03 Electronique / 001D03F Electronique des semiconducteurs. Microélectronique. Optoélectronique. Dispositifs à l'état solide / 001D03F17 Fabrication microélectronique (technologie des matériaux et des surfaces)
- Discipline
- Electronics
- Provenance
- Inist-CNRS
- Base de données
- PASCAL
- Identifiant INIST
- 3594693
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/adma.19950070710 
https://dx.doi.org/10.1002/adma.19950070710
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