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Influence of the liquid phase epitaxial growth conditions on composition profile for Hg1-xCdxTe film

Author
LI, B; CHU, J. H; CHEN, X. Q; CAO, J. Y; TANG, D. Y
Shanghai inst. technical physics, national lab. infrared physics, Shanghai 200083, China
Source

Journal of electronic materials. 1995, Vol 24, Num 8, pp 975-981 ; ref : 21 ref

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Cadmium tellurure Composition chimique Composé ternaire Couche épitaxique Croissance cristalline Diagramme phase Distribution concentration Etude expérimentale LPE Matériau semiconducteur Mercure tellurure Profil profondeur Solution solide Ségrégation Cd Hg Te Hg1-xCdxTe Composé minéral Métal transition composé
Keyword (en)
Cadmium tellurides Chemical composition Ternary compounds Epitaxial layers Crystal growth Phase diagrams Concentration distribution Experimental study LPE Semiconductor materials Mercury tellurides Depth profiles Solid solutions Segregation Inorganic compounds Transition element compounds
Keyword (es)
Distribución concentración
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15L Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3612745

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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