EUV sources using Xe and Sn discharge plasmas : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingBORISOV, Vladimir M; ELTSOV, Aleksander V; IVANOV, Aleksander S et al.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3254-3265, issn 0022-3727, 12 p.Article

X-ray emission from 125 μm diameter aluminium wire x-pinches at currents of 400 kAMITCHELL, I. H; GOMEZ, J. A; SUZUKI, F. A et al.Plasma sources science & technology (Print). 2005, Vol 14, Num 3, pp 501-508, issn 0963-0252, 8 p.Article

Superradiant linear Raman amplification in plasma using a chirped pump pulseERSFELD, B; JAROSZYNSKI, D. A.Physical review letters. 2005, Vol 95, Num 16, pp 165002.1-165002.4, issn 0031-9007Article

Plasma focus as a possible x-ray source for radiographyHUSSAIN, S; SHAFIQ, M; AHMAD, R et al.Plasma sources science & technology (Print). 2005, Vol 14, Num 1, pp 61-69, issn 0963-0252, 9 p.Article

Theoretical modelling of an x-ray source based on stochastic acceleration of charged particles at electron cyclotron resonanceMANUILENKO, O. V; LEE, J. K.Plasma sources science & technology (Print). 2005, Vol 14, Num 1, pp 98-108, issn 0963-0252, 11 p.Article

Pinch plasma EUV source with particle injection : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingMCGEOCH, Malcolm W.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3277-3284, issn 0022-3727, 8 p.Article

The reflectivity of relativistic ultra-thin electron layersWU, H.-C; MEYER-TER-VEHN, J.The European physical journal. D, Atomic, molecular and optical physics (Print). 2009, Vol 55, Num 2, pp 443-449, issn 1434-6060, 7 p.Article

Design of capillary Z-pinch plasma for a soft X-ray laserEMAMI, M.Laser physics. 2007, Vol 17, Num 1, pp 18-21, issn 1054-660X, 4 p.Article

Femto-second electron pulses from an rf linear accelerator as a far-infrared radiation sourceSHIN, S. H; YOON, M.Journal of physics. D, Applied physics (Print). 2006, Vol 39, Num 8, pp 1584-1593, issn 0022-3727, 10 p.Article

High power extreme ultra-violet (EUV) light sources for future lithographyJONKERS, Jeroen.Plasma sources science & technology (Print). 2006, Vol 15, Num 2, issn 0963-0252, S8-S16Conference Paper

Plasma sources for EUV lithography exposure tools : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingBANINE, Vadim; MOORS, Roel.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3207-3212, issn 0022-3727, 6 p.Article

Charged particle dynamics in a `high-pressure' laser ion sourceYEATES, P; COSTELLO, J. T; KENNEDY, E. T et al.Journal of physics. D, Applied physics (Print). 2011, Vol 44, Num 13, issn 0022-3727, 135204.1-135204.10Article

Electrophysical problems in creation of compact and effective sources of short-wave radiation on plasma of capillary dischargesBURTSEV, Vladimir A; BOLSHAKOV, Evgeniy P; KALININ, Nikolay V et al.IEEE transactions on plasma science. 2006, Vol 34, Num 5, pp 1928-1933, issn 0093-3813, 6 p., 1Conference Paper

Assessing the ZR Machine's potential for producing multi-keV X-ray yields in K-shell line and free-bound continuum radiationTHORNHILL, J. Ward; VELIKOVICH, Alexander L; LEPELL, P. David et al.IEEE transactions on plasma science. 2006, Vol 34, Num 5, pp 2377-2391, issn 0093-3813, 15 p., 3Article

Generation of strong coherent extreme ultraviolet radiation from the laser plasma produced on the surface of solid targetsGANEEV, R. A; SUZUKI, M; BABA, M et al.Applied physics. B, Lasers and optics (Print). 2005, Vol 81, Num 8, pp 1081-1089, issn 0946-2171, 9 p.Article

Direct experimental evidence for current-transfer mode operation of nested tungsten wire arrays at 16-19 MACUNEO, M. E; SINARS, D. B; BLISS, D. E et al.Physical review letters. 2005, Vol 94, Num 22, pp 225003.1-225003.4, issn 0031-9007Article

UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingFAHY, K; DUNNE, P; LEBIGOT, E-O et al.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3225-3232, issn 0022-3727, 8 p.Article

Double plasma mirror for ultrahigh temporal contrast ultraintense laser pulsesLEVY, Anna; CECCOTTI, Tiberio; GEINDRE, Jean-Paul et al.Optics letters. 2007, Vol 32, Num 3, pp 310-312, issn 0146-9592, 3 p.Article

Long-pulse KrCl laser with a high discharge qualityCASPER, L. C; BASTIAENS, H. M. J; PETERS, P. J. M et al.Applied physics. B, Lasers and optics (Print). 2007, Vol 88, Num 1, pp 61-66, issn 0946-2171, 6 p.Article

Jet formation and current transfer in X-pinchesBEG, F. N; CIARDI, A; ROSS, I et al.IEEE transactions on plasma science. 2006, Vol 34, Num 5, pp 2325-2329, issn 0093-3813, 5 p., 3Article

Evidence of soft X-ray lasing in SIGNAL pulsed-power facility experiments with argon capillary plasmaOSTASHEV, Vladimir Ivanovich; GAFAROV, Ayrat M; POLITOV, Vadim Yurievich et al.IEEE transactions on plasma science. 2006, Vol 34, Num 5, pp 2368-2376, issn 0093-3813, 9 p., 3Article

EUV discharge light source based on a dense plasma focus operated with positive and negative polarity : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingFOMENKOV, I. V; BOWERING, N; RETTIG, C. L et al.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3266-3276, issn 0022-3727, 11 p.Article

Extreme ultraviolet light sources for use in semiconductor lithography-state of the art and future development : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingSTAMM, Uwe.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3244-3253, issn 0022-3727, 10 p.Article

Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingKRÜCKEN, Thomas; BERGMANN, Klaus; JUSCHKIN, Larissa et al.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3213-3224, issn 0022-3727, 12 p.Article

Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments : Special cluster on extreme ultraviolet light sources for semiconductor manufacturingHANSSON, Björn A. M; HERTZ, Hans M.Journal of physics. D, Applied physics (Print). 2004, Vol 37, Num 23, pp 3233-3243, issn 0022-3727, 11 p.Article