Influences of in situ annealing on microstructure, residual stress and electrical resistivity for sputter-deposited Be coatingLUO, B. C; LI, K; TAN, X. L et al.Journal of alloys and compounds. 2014, Vol 607, pp 150-156, issn 0925-8388, 7 p.Article

Thermal barrier coatings of new rare-earth composite oxide by EB-PVDXU, Z. H; ZHOU, X; WANG, K et al.Journal of alloys and compounds. 2014, Vol 587, pp 126-132, issn 0925-8388, 7 p.Article

Micro-tribology of carbon-coated thin film media with well-defined surface textureTANAKA, H; GOMI, K; MIYAKE, Y et al.IEEE transactions on magnetics. 1993, Vol 29, Num 1, pp 270-275, issn 0018-9464, 1Conference Paper

Simultaneous determination of refractive index, its dispersion and depth-profile of magnesium oxide thin film by spectroscopic ellipsometryVEDAM, K; KIM, S. Y.Applied optics. 1989, Vol 28, Num 14, pp 2691-2694, issn 0003-6935Article

Intrinsic SiO₂ film stress measurements on thermally oxidized SiKOBEDA, E; IRENE, E. A.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1987, Vol 5, Num 1, pp 15-19, issn 0734-211XArticle

A study of the oxidation of selected metal silicidesFRAMPTON, R. D; IRENE, E. A; D'HEURLE, F. M et al.Journal of applied physics. 1987, Vol 62, Num 7, pp 2972-2980, issn 0021-8979Article

Formation of stable MoSi₂/poly-Si films by rapid thermal annealingPORTIUS, R; DIETRICH, D; HÄSSNER, A et al.Physica status solidi. A. Applied research. 1987, Vol 100, Num 1, pp 199-206, issn 0031-8965Article

Optical properties of RuO₂ thin filmPARK, H. L; CHUNG, C. H; KIM, C. H et al.Journal of materials science letters. 1987, Vol 6, Num 9, pp 1093-1094, issn 0261-8028Article

The mechanical properties of wear-resistant coatings. II: Experimental studies and interpretation of hardnessBURNETT, P. J; RICKERBY, D. S.Thin solid films. 1987, Vol 148, Num 1, pp 51-65, issn 0040-6090Article

Annealing of plasma silicon oxynitride filmsDENISSE, C. M. M; TROOST, K. Z; HABRAKEN, F. H. P. M et al.Journal of applied physics. 1986, Vol 60, Num 7, pp 2543-2547, issn 0021-8979Article

Rutherford backscattering study of the photodissolution of Ag in amorphous GeSe₂RENNIE, J; ELLIOTT, S. R; JEYNES, C et al.Applied physics letters. 1986, Vol 48, Num 21, pp 1430-1432, issn 0003-6951Article

Water penetration fronts in thin films deposited at oblique incidenceHODGKINSON, I. J; JACOBSON, M. R; MACLEOD, H. A et al.Thin solid films. 1986, Vol 138, Num 2, pp 289-296, issn 0040-6090Article

Scratch adhesion test of reactively sputtered TiN coatings on a soft substratJE, J. H; GYARMATI, E; NAOUMIDIS, A et al.Thin solid films. 1986, Vol 136, Num 1, pp 57-67, issn 0040-6090Article

Stress and density effects on infrared absorption spectra of silicate glass filmsNAKAMURA, M; KANZAWA, R; SAKAI, K et al.Journal of the Electrochemical Society. 1986, Vol 133, Num 6, pp 1167-1171, issn 0013-4651Article

Amas d'argent induit dans des films minces de chlorure d'argent par implantation ionique et illumination : formation et stabilité = Silver clusters induced in silver chloride thin films by means of ionic irradiation and illumination: formation and stabilityALCHIHABI, Mouna; DUPUY, Josette.1986, 155 pThesis

Diffusion of native defects in (Pb_1-xSn_x)_1-yTe_y during liquid phase epitaxyALEKSANDROVA, O. A; KAMCHATKA, M. I; MIROPOLSKII, M. S et al.Physica status solidi. A. Applied research. 1986, Vol 94, Num 1, pp 139-145, issn 0031-8965Conference Paper

Oxidation mechanisms in high pressure DC-sputtered a -Si filmsKOROPECKI, R. R; ARLE, R; DE BERNARDEZ, L. S et al.Journal of non-crystalline solids. 1985, Vol 74, Num 1, pp 11-17, issn 0022-3093Article

An optical imaging method for wafer warpage measurementsYANG, K. H.Journal of the Electrochemical Society. 1985, Vol 132, Num 5, pp 1214-1218, issn 0013-4651Article

Autodoping of epitaxial silicon layers(II) diffusion-induced autodopingKUHNE, H; GAWORZEWSKI, P; MALZE, W et al.Crystal research and technology (1979). 1985, Vol 20, Num 5, pp 635-644, issn 0232-1300Article

Effect of annealing on chemical state of phosphorus in SiO₂ filmsWU, O. K. T; SAXENA, A. N.Journal of the Electrochemical Society. 1985, Vol 132, Num 4, pp 932-936, issn 0013-4651Article

Elastic relaxation in transmission electron microscopy of strained-layer superlatticesGIBSON, J. M; HULL, R; BEAN, J. C et al.Applied physics letters. 1985, Vol 46, Num 7, pp 649-651, issn 0003-6951Article

The effect of deposition conditions on the refractive index of LTCVD SiO₂ filmsCOBIANU, C; PAVELESCU, C; PAUNESCU, A et al.Journal of materials science letters. 1985, Vol 4, Num 11, pp 1419-1420, issn 0261-8028Article

Thermal coupling of particulates to substratesUTTERBACK, S; DACOL, F. H; ERMERT, H et al.Applied physics letters. 1985, Vol 46, Num 11, pp 1054-1056, issn 0003-6951Article

Etude de la concentration superficielle de GaInAs, GaAlAs et GaPAs par rendement de photoémission X = Study of the surface concentration of GaInAs, GaAlAs and GaPAs by X-ray photoemission yieldBOUABELLOU, A; SCHMELEV, V. N.Journal de microscopie et de spectroscopie électroniques. 1985, Vol 10, Num 6, pp 551-562, issn 0395-9279Article

Diffusion size effectSAPOZHNIKOV, V. B; GOLDINER, M. G.Thin solid films. 1984, Vol 111, Num 2, pp 183-187, issn 0040-6090Article